Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.60 |
| ▸ | CES2 | O00748 | 2/20 | 0.60 |
| ▸ | CES1 | P23141 | 2/20 | 0.60 |
| ▸ | NAAA | Q02083 | 3/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.50 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | ASAH1 | Q13510 | 2/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | ACER2 | Q5QJU3 | 1/20 | 0.43 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL11319258 | 1.00 | LMNA (0.60) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL10884070 | 1.00 | LMNA (0.60) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL10883525 | 1.00 | LMNA (0.60) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL2754342 | 0.99 | LMNA (0.62) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL50247 | 0.94 | LMNA (0.64) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL28774157 | 0.91 | LMNA (0.60) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL28674567 | 0.90 | LMNA (0.58) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL158692 | 0.88 | LMNA (0.68) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL20895712 | 0.88 | LMNA (0.55) | LMNACES2CES1NAAASMN1; SMN2 | |
| Benzoin SCHEMBL28225027 | 0.88 | LMNA (0.55) | LMNACES2CES1NAAASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4042386-A | WATER DEVELOPABLE, PHOTOPOLYMERIZABLE | NAPP SYSTEMS (US) | 1977-08-16 | — | — | US | claimed |
| US-4023973-A | PRINTING | JAPAN SYNTHETIC RUBBER CO., LTD. (JA) | 1977-05-17 | — | — | US | claimed |
| US-20240239940-A1 | RADICALLY POLYMERIZABLE RESIN COMPOSITION | RESONAC CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-4357381-A1 | RADICALLY POLYMERIZABLE RESIN COMPOSITION | Resonac Corporation (JP) | 2024-04-24 | — | — | EP | disclosed |
| CN-117480192-A | Free radical polymerizable resin composition | 株式会社力森诺科 | 2024-01-30 | — | — | CN | disclosed |
| CN-112805310-B | Vinyl ester resin composition, composite material containing the same, and cured product of the composition or composite material | 株式会社力森诺科 | 2023-08-18 | — | — | CN | disclosed |
| CN-110799626-B | Composition, film, laminated structure, light-emitting device, display, and method for producing composition | 住友化学株式会社 | 2023-02-28 | — | — | CN | disclosed |
| WO-2022264761-A1 | RADICALLY POLYMERIZABLE RESIN COMPOSITION | 昭和電工株式会社 | 2022-12-22 | — | — | WO | disclosed |
| US-11326006-B2 | Organic thin-film transistor and polymer compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-10 | — | — | US | disclosed |
| CN-113025193-A | Radical polymerizable varnish for coil | 昭和电工株式会社 | 2021-06-25 | — | — | CN | disclosed |
| US-20210151680-A1 | ORGANIC THIN-FILM TRANSISTOR AND POLYMER COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-05-20 | — | — | US | disclosed |
| US-4179478-A | Process for the production of binders | BAYER AKTIENGESELLSCHAFT (DE) | 1979-12-18 | — | — | US | disclosed |
| EP-0005380-A2 | Phototropic photosensitive compositions containing a fluoran colorformer | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| EP-0005379-A2 | Photosensitive compositions containing carbonylic halides as activators | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| US-4162274-A | Crosslinkable urethane resins containing vinyl and carboxyl groups | BAYER AKTIENGESELLSCHAFT (DE) | 1979-07-24 | — | — | US | disclosed |
| US-4049745-A | REACTION PRODUCT OF POLYEPOXIDE AND AN ACRYLIC ACID | BAYER AKTIENGESELLSCHAFT (DT) | 1977-09-20 | — | — | US | disclosed |
| US-4038078-A | PROCESS USING SUCTION TO FORM RELIEF IMAGES | NIPPON PAINT CO., LTD. (JA) | 1977-07-26 | — | — | US | disclosed |
| US-4033920-A | COPOLYMERIZATION OF ACRYLIC MONOMERS AND UNSATURATED EPOXY MONOMERS | KANSAI PAINT COMPANY, LTD. (JA) | 1977-07-05 | — | — | US | disclosed |
| US-4023973-A | PRINTING | JAPAN SYNTHETIC RUBBER CO., LTD. (JA) | 1977-05-17 | — | — | US | disclosed |
| US-3935173-A | POLYESTER TYPE OLIGO(METH) ACRYLATE | TOAGOSEI CHEMICAL INDUSTRIAL CO. LTD. (JA) | 1976-01-27 | — | — | US | disclosed |