Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 6/20 | 0.36 |
| ▸ | THRA | P10827 | 5/20 | 0.35 |
| ▸ | PPARA | Q07869 | 2/20 | 0.35 |
| ▸ | PPARG | P37231 | 1/20 | 0.35 |
| ▸ | NAAA | Q02083 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | FAAH | O00519 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.33 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.33 |
| ▸ | MET | P08581 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15907708 | 0.96 | PPARA (0.38) | THRBTHRAPPARAPPARGCA1 | |
| SCHEMBL15907704 | 0.91 | CA1 (0.41) | THRBPPARAPPARGMEN1KMT2A | |
| SCHEMBL16687563 | 0.87 | NAAA (0.36) | THRBTHRANAAAMEN1KMT2A | |
| SCHEMBL16687562 | 0.83 | AKR1B10 (0.38) | THRBTHRAPPARAPPARGNAAA | |
| SCHEMBL15907716 | 0.83 | MEN1 (0.39) | PPARAPPARGMEN1KMT2ACA1 | |
| SCHEMBL15907711 | 0.78 | NAAA (0.37) | THRBTHRANAAAMEN1KMT2A | |
| SCHEMBL15907710 | 0.78 | CA1 (0.42) | PPARAPPARGMEN1KMT2ACA1 | |
| SCHEMBL7530246 | 0.76 | TSHR (0.55) | THRBTHRAMEN1KMT2ACA1 | |
| SCHEMBL15907717 | 0.74 | AKR1B10 (0.39) | THRBTHRAPPARAPPARGNAAA | |
| SCHEMBL27272361 | 0.73 | ELANE (0.42) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9846360-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760010-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20170003590-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160363866-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-9023587-B2 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-9023587-B2 | Negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20140212810-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-31 | — | — | US | disclosed |