SCHEMBL15907993

SCHEMBL15907993

CCC/C(=N/OC(=O)c1ccc(C)cc1)C(=O)c1ccc(Sc2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.44
ALDH1A1 P00352 3/20 0.44
NPC1 O15118 3/20 0.44
RAB9A P51151 3/20 0.44
PKM P14618 2/20 0.44
CDK5 Q00535 1/20 0.44
PAX8 Q06710 1/20 0.44
CDK5R1 Q15078 1/20 0.44
L3MBTL1 Q9Y468 3/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
MAPT P10636 4/20 0.42
THRB P10828 1/20 0.42
HPGD P15428 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CES2 O00748 1/20 0.40
CES1 P23141 1/20 0.40
KDM4E B2RXH2 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
CYP1A2 P05177 1/20 0.40
POLB P06746 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12328370 0.94 ALDH1A1 (0.43) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL20578374 0.94 ALDH1A1 (0.43) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL14429963 0.91 CES2 (0.42) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL19795442 0.89 CES2 (0.45) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL27996751 0.88 KMT2A (0.49) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL21409907 0.87 CES2 (0.46) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL13415039 0.87 CES2 (0.46) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL17445967 0.87 CES2 (0.46) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL149908 0.86 CES2 (0.47) KMT2AALDH1A1NPC1RAB9APKM
SCHEMBL149909 0.86 CES2 (0.47) KMT2AALDH1A1NPC1RAB9APKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448476-B2 Photoresist composition and method of manufacturing a thin film transistor substrate SAMSUNG DISPLAY CO., LTD. (KR) 2016-09-20 US disclosed
US-9448476-B2 Photoresist composition and method of manufacturing a thin film transistor substrate SAMSUNG DISPLAY CO., LTD. (KR) 2016-09-20 US disclosed
US-20150212411-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE SAMSUNG DISPLAY CO., LTD. (KR) 2015-07-30 US disclosed
US-20150212411-A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE SAMSUNG DISPLAY CO., LTD. (KR) 2015-07-30 US disclosed
US-20140212809-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2014-07-31 US disclosed
US-20140212809-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2014-07-31 US disclosed