SCHEMBL15915460

SCHEMBL15915460

c1ccc([SiH](O[SiH](c2ccccc2)C2CCCCC2)C2CCCCC2)cc1

nearest known ligand 0.35

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 2/20 0.35
EPHX2 P34913 1/20 0.33
RAB9A P51151 2/20 0.33
ALDH1A1 P00352 1/20 0.33
EPHX1 P07099 2/20 0.32
CNR1 P21554 1/20 0.32
CNR2 P34972 1/20 0.32
G6PC1 P35575 1/20 0.32
HPGD P15428 3/20 0.32
POLB P06746 1/20 0.32
SLC18A3 Q16572 1/20 0.32
USP2 O75604 1/20 0.31
HSD17B10 Q99714 1/20 0.31
TAAR1 Q96RJ0 1/20 0.31
SIGMAR1 Q99720 1/20 0.31
NPC1 O15118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15915709 0.98 IDO1 (0.32) IDO1EPHX2RAB9AALDH1A1POLB
SCHEMBL28845539 0.76 TAAR1 (0.30) ALDH1A1TAAR1
SCHEMBL15914974 0.76 EPHX2 (0.36) IDO1EPHX2RAB9AALDH1A1EPHX1
SCHEMBL561158 0.76 EPHX2 (0.36) IDO1EPHX2RAB9AALDH1A1EPHX1
SCHEMBL15914932 0.73 POLB (0.35) EPHX2ALDH1A1G6PC1POLBSLC18A3
SCHEMBL15186488 0.73 POLB (0.35) EPHX2ALDH1A1G6PC1POLBSLC18A3
SCHEMBL28451958 0.68 EPHX2 (0.39) EPHX2RAB9AALDH1A1EPHX1G6PC1
SCHEMBL24305874 0.67 AGER (0.39) RAB9AALDH1A1EPHX1POLBNPC1
SCHEMBL6273135 0.67 FABP7 (0.36) IDO1RAB9AALDH1A1G6PC1HPGD
SCHEMBL16309524 0.67 FABP7 (0.36) IDO1RAB9AALDH1A1G6PC1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
CN-103781937-B Filmogen, the diaphragm seal using the filmogen, and application thereof 东曹株式会社 2017-05-31 CN disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed