SCHEMBL15914932

SCHEMBL15914932

c1ccc([SiH](C2CCCC2)C2CCCC2)cc1

nearest known ligand 0.36

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.35
GAA P10253 3/20 0.34
ALDH1A1 P00352 2/20 0.34
NOS1 P29475 3/20 0.34
NOS2 P35228 3/20 0.34
EPHX2 P34913 1/20 0.33
NOS3 P29474 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
SLC18A3 Q16572 2/20 0.32
G6PC1 P35575 1/20 0.32
KEAP1 Q14145 1/20 0.31
NFE2L2 Q16236 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL561158 0.98 EPHX2 (0.36) POLBGAAALDH1A1NOS1NOS2
SCHEMBL15186488 0.80 POLB (0.35) POLBGAAALDH1A1NOS1NOS2
SCHEMBL15914974 0.78 EPHX2 (0.36) POLBGAAALDH1A1NOS1NOS2
SCHEMBL15915709 0.75 IDO1 (0.32) POLBGAAALDH1A1NOS1NOS2
SCHEMBL15915460 0.73 IDO1 (0.35) POLBALDH1A1EPHX2SLC18A3G6PC1
SCHEMBL24305874 0.69 AGER (0.39) POLBALDH1A1NFE2L2
SCHEMBL18860237 0.69 HRH3 (0.32) NOS1NOS2NOS3SLC18A3
SCHEMBL10655430 0.65 KDM4E (0.38) POLBGAAALDH1A1NOS1NOS2
SCHEMBL10652725 0.65 ALDH1A1 (0.38) GAAALDH1A1NOS1NOS2L3MBTL1
SCHEMBL1318135 0.64 ALDH1A1 (0.42) POLBALDH1A1NOS1NOS2EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118852230-A Preparation method of polysubstituted hydrosilane compound 中国科学院兰州化学物理研究所 2024-10-29 CN disclosed
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed