SCHEMBL15915938

SCHEMBL15915938

CC(C)[SiH2]C1CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.31
ADH1B P00325 1/20 0.30
ADH1C P00326 1/20 0.30
ADH1A P07327 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15914506 0.97
SCHEMBL20003531 0.76 SHBG (0.37) SHBG
SCHEMBL27752398 0.74
SCHEMBL236035 0.74 TDP1 (0.32)
SCHEMBL15915274 0.74 SHBG (0.41) SHBG
SCHEMBL7063593 0.71
SCHEMBL7739569 0.70
SCHEMBL231582 0.70
SCHEMBL7741133 0.70
SCHEMBL15915238 0.70 SHBG (0.37) SHBG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9970103-B2 Film deposition material, sealing film using the same and use thereof TOSOH CORPORATION (JP) 2018-05-15 US disclosed
CN-103781937-B Filmogen, the diaphragm seal using the filmogen, and application thereof 东曹株式会社 2017-05-31 CN disclosed
US-20160326642-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2016-11-10 US disclosed
US-20140219903-A1 FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF TOSOH CORPORATION (JP) 2014-08-07 US disclosed
CN-103781937-A Film-forming material, sealing film using same, and use of sealing film TOSOH CORP 2014-05-07 CN disclosed
CN-1837221-A Production processes for triorganomonochlorosilanes HOKKO CHEM IND CO (JP) 2006-09-27 CN disclosed
CN-1612886-A Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes HOKKO CHEM IND CO (JP) 2005-05-04 CN disclosed