⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27752398 | 0.74 | — | — | |
| SCHEMBL15915938 | 0.71 | SHBG (0.31) | — | |
| SCHEMBL27752403 | 0.70 | — | — | |
| SCHEMBL15914506 | 0.67 | — | — | |
| SCHEMBL7741133 | 0.65 | — | — | |
| SCHEMBL231582 | 0.65 | — | — | |
| SCHEMBL7739486 | 0.65 | — | — | |
| SCHEMBL742451 | 0.65 | — | — | |
| SCHEMBL7739214 | 0.65 | — | — | |
| SCHEMBL20003531 | 0.65 | SHBG (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107663275-B | Gap filling polymer for filling fine pattern gap and method for manufacturing semiconductor device using the same | 爱思开海力士有限公司 | 2020-11-24 | — | — | CN | disclosed |
| US-9892964-B1 | Gap-fill polymer for filling fine pattern gaps and method for fabricating semiconductor device using the same | SK Hynix Inc. (KR) | 2018-02-13 | — | — | US | disclosed |
| US-20180033688-A1 | GAP-FILL POLYMER FOR FILLING FINE PATTERN GAPS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME | SK Hynix Inc. (KR) | 2018-02-01 | — | — | US | disclosed |
| EP-1311462-A2 | ARRAYS OF IMMOBILISED BIOMOLECULES, PRODUCTION AND USE THEREOF | Giesing, Michael (DE) | 2003-05-21 | — | — | EP | disclosed |
| WO-2002018634-A2 | ARRAYS OF IMMOBILISED BIOMOLECULES, PRODUCTION AND USE THEREOF | GIESING, MICHAEL (DE) | 2002-03-07 | — | — | WO | disclosed |