SCHEMBL15929629

SCHEMBL15929629

Cc1ccc(S(=O)(=O)c2ccc(-n3c(=O)n(C)c4ccccc43)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 6/20 0.47
HPD P32754 2/20 0.45
PARG Q86W56 1/20 0.45
PGR P06401 1/20 0.44
KMT2A Q03164 6/20 0.44
ADORA3 P0DMS8 1/20 0.44
PKM P14618 2/20 0.43
SMN1; SMN2 Q16637 4/20 0.43
HTT P42858 1/20 0.43
ALDH1A1 P00352 6/20 0.42
MEN1 O00255 2/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
KDM4E B2RXH2 5/20 0.41
HPGD P15428 3/20 0.41
HSD17B10 Q99714 2/20 0.41
LMNA P02545 1/20 0.41
USP2 O75604 1/20 0.40
GLA P06280 1/20 0.40
ALOX15 P16050 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15929630 0.99 GAA (0.46) GAAHPDPARGPGRKMT2A
SCHEMBL15929652 0.92 MAPT (0.46) GAAHPDPARGPGRKMT2A
SCHEMBL15929649 0.92 HTT (0.57) GAAHPDPARGPGRKMT2A
SCHEMBL14826596 0.92 MAPT (0.46) GAAHPDPARGPGRKMT2A
SCHEMBL15082037 0.89 PGR (0.53) HPDPGRKMT2AADORA3SMN1; SMN2
SCHEMBL14826593 0.89 HTT (0.53) GAAHPDPARGKMT2AADORA3
SCHEMBL15929651 0.87 HTT (0.56) HPDPARGKMT2ASMN1; SMN2HTT
SCHEMBL14826600 0.85 HPD (0.47) HPDPARGKMT2AADORA3SMN1; SMN2
SCHEMBL14826597 0.85 HTT (0.49) HPDPARGKMT2ASMN1; SMN2HTT
SCHEMBL15929647 0.83 HTT (0.47) HPDPARGKMT2ASMN1; SMN2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9035287-B2 Polymeric materials for use in metal-oxide-semiconductor field-effect transistors POLYERA CORPORATION (US) 2015-05-19 US disclosed
US-20140217395-A1 Polymeric Materials for Use in Metal-Oxide-Semiconductor Field-Effect Transistors POLYERA CORPORATION (US) 2014-08-07 US disclosed