SCHEMBL15929679

SCHEMBL15929679

COc1ccc(Oc2ccc(S(=O)(=O)c3ccc(C)cc3)cc2)cc1OC(=O)/C=C/c1ccccc1

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HTT P42858 3/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
HTR1A P08908 1/20 0.48
L3MBTL1 Q9Y468 3/20 0.47
LMNA P02545 2/20 0.47
KDM4E B2RXH2 3/20 0.47
MAPT P10636 3/20 0.47
TDP1 Q9NUW8 1/20 0.46
KMT2A Q03164 4/20 0.46
ALDH1A1 P00352 3/20 0.46
GAA P10253 1/20 0.45
MEN1 O00255 2/20 0.45
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
TNFRSF1A P19438 1/20 0.44
BACE1 P56817 1/20 0.44
ALOX12 P18054 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15929673 0.93 HTT (0.47) HTTSMN1; SMN2HTR1AL3MBTL1LMNA
SCHEMBL15929677 0.85 ABCG2 (0.58) HTTSMN1; SMN2L3MBTL1LMNAMAPT
SCHEMBL15929666 0.81 TRIM24 (0.40) HTTSMN1; SMN2L3MBTL1LMNAKDM4E
SCHEMBL15929602 0.78 HTT (0.63) HTTSMN1; SMN2L3MBTL1LMNATDP1
SCHEMBL15929691 0.78 MAPT (0.56) HTTSMN1; SMN2L3MBTL1LMNAMAPT
SCHEMBL17301255 0.77 HTR1A (0.60) SMN1; SMN2HTR1AL3MBTL1KDM4EMAPT
SCHEMBL15929676 0.77 HTT (0.50) HTTSMN1; SMN2L3MBTL1LMNAKDM4E
SCHEMBL19318193 0.75 HTT (0.57) HTTSMN1; SMN2L3MBTL1KDM4ETDP1
SCHEMBL8846661 0.74 KMT2A (0.71) SMN1; SMN2HTR1AL3MBTL1LMNAKDM4E
SCHEMBL17301249 0.74 KMT2A (0.63) SMN1; SMN2KDM4EMAPTKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170227846-A1 Photopatternable Compositions and Methods of Fabricating Transistor Devices Using Same USINVEST LLC 2017-08-10 US disclosed
US-9035287-B2 Polymeric materials for use in metal-oxide-semiconductor field-effect transistors POLYERA CORPORATION (US) 2015-05-19 US disclosed
US-20140217395-A1 Polymeric Materials for Use in Metal-Oxide-Semiconductor Field-Effect Transistors POLYERA CORPORATION (US) 2014-08-07 US disclosed