SCHEMBL15933348

SCHEMBL15933348

CCC(C)(C)COC(=O)C(C)C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.37
POLB P06746 1/20 0.37
MAPT P10636 1/20 0.37
CTSK P43235 3/20 0.35
LMNA P02545 2/20 0.32
SERPINE1 P05121 1/20 0.32
HSD17B10 Q99714 1/20 0.32
HTT P42858 1/20 0.32
GRIN2D O15399 1/20 0.32
GRIN3B O60391 1/20 0.32
GRIN1 Q05586 1/20 0.32
GRIN2A Q12879 1/20 0.32
GRIN2B Q13224 1/20 0.32
GRIN2C Q14957 1/20 0.32
GRIN3A Q8TCU5 1/20 0.32
MMP8 P22894 1/20 0.32
TSHR P16473 2/20 0.31
CYP3A4 P08684 1/20 0.31
NFKB1 P19838 1/20 0.31
ADRA1A P35348 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7934757 0.88 ALDH1A1 (0.40) ALDH1A1POLBMAPTLMNASERPINE1
SCHEMBL23077816 0.83 GRIN2D (0.47) CTSKLMNASERPINE1HSD17B10HTT
SCHEMBL12044661 0.83 LMNA (0.42) ALDH1A1POLBMAPTLMNASERPINE1
SCHEMBL20747680 0.83 GRIN2D (0.47) CTSKLMNASERPINE1HSD17B10HTT
SCHEMBL1636727 0.82 ALDH1A1 (0.37) ALDH1A1POLBMAPTSERPINE1HTT
Hydrochloric Acid SCHEMBL23827952 0.81 GRIN2D (0.46) CTSKLMNASERPINE1HSD17B10GRIN2D
Hydrochloric Acid SCHEMBL23827949 0.81 GRIN2D (0.46) CTSKLMNASERPINE1HSD17B10GRIN2D
SCHEMBL954672 0.80 MMP8 (0.38) ALDH1A1POLBMAPTSERPINE1HTT
SCHEMBL15894726 0.80 KDM4E (0.40) ALDH1A1POLBMAPTLMNASERPINE1
SCHEMBL11758824 0.80 ALDH1A1 (0.37) ALDH1A1POLBMAPTLMNASERPINE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3431479-B1 METHOD FOR PRODUCING DIOL HAVING CYCLIC ACETAL SKELETON MITSUBISHI GAS CHEMICAL CO (JP) 2020-08-26 EP disclosed
US-20160017169-A1 UV-CURABLE COATING COMPOSITION COVESTRO DEUTSCHLAND AG (DE) 2016-01-21 US disclosed
US-20160017169-A1 UV-CURABLE COATING COMPOSITION COVESTRO DEUTSCHLAND AG (DE) 2016-01-21 US disclosed
WO-2014118251-A1 UV-CURABLE COATING COMPOSITION BAYER MATERIALSCIENCE AG (DE) 2014-08-07 WO disclosed