Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LDHA | P00338 | 1/20 | 0.39 |
| ▸ | PSD | A5PKW4 | 1/20 | 0.37 |
| ▸ | EP300 | Q09472 | 2/20 | 0.35 |
| ▸ | KAT2B | Q92831 | 2/20 | 0.35 |
| ▸ | KAT8 | Q9H7Z6 | 2/20 | 0.35 |
| ▸ | IDO1 | P14902 | 3/20 | 0.34 |
| ▸ | GAA | P10253 | 4/20 | 0.32 |
| ▸ | MEN1 | O00255 | 4/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.32 |
| ▸ | HKDC1 | Q2TB90 | 2/20 | 0.32 |
| ▸ | MITF | O75030 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | GFER | P55789 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL271896 | 0.96 | LDHA (0.38) | LDHAPSDEP300KAT2BKAT8 | |
| SCHEMBL3120012 | 0.95 | LDHA (0.37) | LDHAPSDEP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL31168271 | 0.88 | LDHA (0.44) | LDHAPSDEP300KAT2BKAT8 | |
| Trifluoromethanesulfonic Acid SCHEMBL36124 | 0.88 | LDHA (0.44) | LDHAPSDEP300KAT2BKAT8 | |
| SCHEMBL3122221 | 0.83 | PSD (0.34) | LDHAPSDEP300KAT2BKAT8 | |
| SCHEMBL30316829 | 0.83 | CA1 (0.34) | — | |
| SCHEMBL5698053 | 0.83 | CA1 (0.34) | — | |
| SCHEMBL3117405 | 0.82 | CA1 (0.34) | LDHAPSDEP300KAT2BKAT8 | |
| SCHEMBL3120425 | 0.82 | CYP1A2 (0.34) | — | |
| SCHEMBL3122212 | 0.81 | CYP1A2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9176381-B2 | Positive type photosensitive resin composition | CHEIL INDUSTRIES INC. (KR) | 2015-11-03 | — | — | US | disclosed |
| US-20110159428-A1 | Positive Type Photosensitive Resin Composition | CHEIL INDUSTRIES INC. (KR) | 2011-06-30 | — | — | US | disclosed |
| US-20110091818-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20100279226-A1 | RESIST PROCESSING METHOD | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-11-04 | — | — | US | disclosed |
| US-20100273113-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |
| US-20100273112-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |