SCHEMBL15958623

SCHEMBL15958623

O=C(CSC1CCCC1)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.55
RAB9A P51151 4/20 0.55
SMN1; SMN2 Q16637 3/20 0.55
GAA P10253 1/20 0.55
ALOX15 P16050 3/20 0.51
MAPK1 P28482 3/20 0.51
HPGD P15428 2/20 0.49
L3MBTL1 Q9Y468 2/20 0.49
KMT2A Q03164 3/20 0.49
NPC1 O15118 2/20 0.46
KDM4E B2RXH2 2/20 0.45
MAPT P10636 2/20 0.45
CYP3A4 P08684 2/20 0.45
MEN1 O00255 1/20 0.45
CES1 P23141 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
HSD17B10 Q99714 1/20 0.43
HDAC3 O15379 1/20 0.42
HDAC4 P56524 1/20 0.42
HDAC1 Q13547 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9786954 0.77 GSK3B (0.50) ALDH1A1RAB9AGAAKMT2AMAPT
SCHEMBL11383302 0.77 ALDH1A1 (0.42) ALDH1A1RAB9ASMN1; SMN2GAAHPGD
SCHEMBL19749343 0.76 HPGD (0.47) ALDH1A1RAB9ASMN1; SMN2GAAALOX15
SCHEMBL7896309 0.75 NPC1 (0.48) ALDH1A1RAB9ASMN1; SMN2MAPK1HPGD
SCHEMBL14511969 0.74 ALDH1A1 (0.49) ALDH1A1RAB9ASMN1; SMN2ALOX15MAPK1
SCHEMBL3706423 0.72 KMT2A (0.43) ALDH1A1RAB9ASMN1; SMN2GAAALOX15
SCHEMBL5031039 0.72 ALDH1A1 (0.65) ALDH1A1RAB9ASMN1; SMN2ALOX15MAPK1
SCHEMBL133738 0.72 ALDH1A1 (0.87) ALDH1A1RAB9ASMN1; SMN2ALOX15MAPK1
SCHEMBL2439457 0.72 MAPT (0.56) ALDH1A1RAB9ASMN1; SMN2ALOX15MAPK1
SCHEMBL13042918 0.72 RAB9A (0.47) ALDH1A1RAB9ASMN1; SMN2GAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107615168-B Radiation-sensitive composition 日产化学工业株式会社 2023-12-19 CN disclosed
CN-117008420-A Radiation-sensitive composition 日产化学工业株式会社 2023-11-07 CN disclosed
CN-115840336-A Adhesive film forming material, pattern forming method, and adhesive film forming method 信越化学工业株式会社 2023-03-24 CN disclosed
CN-110963952-B Onium salt, resist composition and pattern forming method 信越化学工业株式会社 2022-10-21 CN disclosed
US-8808965-B2 Pattern forming method, pattern, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-08-19 US disclosed