Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 1/20 | 0.53 |
| ▸ | MTNR1A | P48039 | 9/20 | 0.46 |
| ▸ | MTNR1B | P49286 | 9/20 | 0.46 |
| ▸ | NOS1 | P29475 | 1/20 | 0.44 |
| ▸ | NOS2 | P35228 | 1/20 | 0.44 |
| ▸ | FAAH | O00519 | 1/20 | 0.43 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.42 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7455570 | 0.87 | APP (0.60) | APPMTNR1AMTNR1BNOS1NOS2 | |
| SCHEMBL7239002 | 0.84 | APP (0.54) | APPMTNR1AMTNR1BNOS1NOS2 | |
| SCHEMBL7022072 | 0.84 | FAAH (0.56) | APPMTNR1AMTNR1BFAAHKMT2A | |
| SCHEMBL595463 | 0.83 | APP (0.53) | APPMTNR1AMTNR1BFAAHCHRNB2 | |
| SCHEMBL5957100 | 0.83 | MTNR1A (0.53) | APPMTNR1AMTNR1BNOS1NOS2 | |
| SCHEMBL1428483 | 0.83 | KDM4E (0.56) | APPMTNR1AMTNR1BCHRNB2CHRNA4 | |
| SCHEMBL10660855 | 0.83 | TSHR (0.58) | APPMTNR1AMTNR1BFAAH | |
| SCHEMBL8807486 | 0.83 | APP (0.53) | APPMTNR1AMTNR1BNOS1NOS2 | |
| SCHEMBL9911816 | 0.82 | APP (0.55) | APPMTNR1AMTNR1BNOS1NOS2 | |
| SCHEMBL10339364 | 0.82 | APP (0.55) | APPMTNR1AMTNR1BNOS1NOS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |