Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 5/20 | 0.67 |
| ▸ | APP | P05067 | 2/20 | 0.57 |
| ▸ | ACHE | P22303 | 7/20 | 0.56 |
| ▸ | BCHE | P06276 | 2/20 | 0.56 |
| ▸ | MAOB | P27338 | 2/20 | 0.55 |
| ▸ | MAOA | P21397 | 1/20 | 0.55 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.55 |
| ▸ | KDM4A | O75164 | 2/20 | 0.54 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.54 |
| ▸ | TMEM97 | Q5BJF2 | 2/20 | 0.53 |
| ▸ | CARM1 | Q86X55 | 1/20 | 0.53 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.53 |
| ▸ | PRMT8 | Q9NR22 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15966156 | 1.00 | SIGMAR1 (0.67) | SIGMAR1APPACHEBCHEMAOB | |
| SCHEMBL15966146 | 1.00 | SIGMAR1 (0.67) | SIGMAR1APPACHEBCHEMAOB | |
| SCHEMBL1268694 | 0.93 | SIGMAR1 (0.61) | SIGMAR1APPACHEL3MBTL1TMEM97 | |
| SCHEMBL7225346 | 0.87 | SIGMAR1 (0.85) | SIGMAR1ACHEMAOBMAOAKDM4A | |
| SCHEMBL29733117 | 0.87 | SIGMAR1 (0.85) | SIGMAR1ACHEMAOBMAOAKDM4A | |
| SCHEMBL1268109 | 0.85 | CARM1 (0.60) | SIGMAR1MAOBMAOATMEM97CARM1 | |
| SCHEMBL2687056 | 0.84 | SIGMAR1 (0.59) | SIGMAR1APPACHEBCHEL3MBTL1 | |
| Hydrochloric Acid SCHEMBL5463194 | 0.84 | CARM1 (0.58) | SIGMAR1MAOBMAOATMEM97CARM1 | |
| SCHEMBL18065732 | 0.83 | SIGMAR1 (0.62) | SIGMAR1APPACHEBCHEMAOB | |
| SCHEMBL16260101 | 0.82 | SIGMAR1 (0.76) | SIGMAR1ACHEMAOBMAOAKDM4A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9315670-B2 | Composition for forming resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-19 | — | — | US | disclosed |
| US-20140235796-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-21 | — | — | US | disclosed |