SCHEMBL16010672

SCHEMBL16010672

CC(C)CCCCc1ccc(O)c(-n2nc3ccc(Cl)cc3n2)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IGF1R P08069 4/20 0.41
ALOX15 P16050 4/20 0.41
NPC1 O15118 1/20 0.39
LMNA P02545 1/20 0.39
RAB9A P51151 1/20 0.39
KCNH2 Q12809 1/20 0.35
TMEM97 Q5BJF2 1/20 0.35
SIGMAR1 Q99720 1/20 0.35
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
AKR1B1 P15121 1/20 0.34
RXFP1 Q9HBX9 1/20 0.33
TP53 P04637 1/20 0.33
MAPT P10636 1/20 0.33
GRIN2D O15399 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33
GRIN2C Q14957 1/20 0.33
KCNMA1 Q12791 1/20 0.32
CDK1 P06493 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9240944 0.87 IGF1R (0.43) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL11420436 0.86 NPC1 (0.50) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL11410372 0.86 KAT8 (0.41) NPC1LMNARAB9ATP53
SCHEMBL31252564 0.86 KAT8 (0.43) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL3674564 0.86 NPC1 (0.51) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL2589692 0.86 NPC1 (0.42) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL28755473 0.86 ALOX15 (0.44) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL30240998 0.86 ALOX15 (0.44) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL8649490 0.84 ALOX15 (0.42) IGF1RALOX15NPC1LMNARAB9A
SCHEMBL9638776 0.83 NPC1 (0.43) IGF1RALOX15NPC1LMNARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9389507-B2 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition FUJIFILM CORPORATION (JP) 2016-07-12 US disclosed
US-20140255846-A1 POLYMERIZABLE COMPOSITION, AND PHOTOSENSITIVE LAYER, PERMANENT PATTERN, WAFER-LEVEL LENS, SOLID-STATE IMAGING DEVICE AND PATTERN FORMING METHOD EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2014-09-11 US disclosed