Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.45 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.45 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | FDPS | P14324 | 3/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.42 |
| ▸ | GMNN | O75496 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | THPO | P40225 | 1/20 | 0.42 |
| ▸ | MTOR | P42345 | 1/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | CETP | P11597 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | UBE2N | P61088 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16074866 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL16074883 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL16074773 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL16074853 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL16074930 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL5898206 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL16074728 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL6053227 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL16074898 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS | |
| SCHEMBL16074921 | 1.00 | GPR84 (0.45) | GPR84SPHK1FFAR1LMNAFDPS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220033334-A1 | METHOD FOR PRODUCING DIVINYL ETHER COMPOUND HAVING ALKYLENE SKELETON | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2022-02-03 | — | — | US | disclosed |
| US-20220033335-A1 | METHOD FOR PRODUCING DIVINYL ETHER COMPOUND HAVING ALKYLENE SKELETON | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2022-02-03 | — | — | US | disclosed |
| EP-3889126-A1 | METHOD FOR PRODUCING DIVINYL ETHER COMPOUND HAVING ALKYLENE SKELETON | Maruzen Petrochemical Co., Ltd. (JP) | 2021-10-06 | — | — | EP | disclosed |
| EP-3889125-A1 | METHOD FOR PRODUCING DIVINYL ETHER COMPOUND HAVING ALKYLENE SKELETON | Maruzen Petrochemical Co., Ltd. (JP) | 2021-10-06 | — | — | EP | disclosed |
| CN-113166016-A | Method for producing divinyl ether compound having alkylene skeleton | 丸善石油化学株式会社 | 2021-07-23 | — | — | CN | disclosed |
| CN-113166015-A | Method for producing divinyl ether compound having alkylene skeleton | 丸善石油化学株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-9188866-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-9176382-B2 | Composition for forming titanium-containing resist underlayer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-03 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273447-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
| US-20140273448-A1 | COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220033334-A1 | METHOD FOR PRODUCING DIVINYL ETHER COMPOUND HAVING ALKYLENE SKELETON | DECR2, KAT8, DECR1 | GPR84 3838/4885SPHK1 1974/4885FFAR1 1626/4885 |
| US-20220033335-A1 | METHOD FOR PRODUCING DIVINYL ETHER COMPOUND HAVING ALKYLENE SKELETON | DECR2, DECR1, ACMSD | GPR84 4490/4885SPHK1 1892/4885FFAR1 1208/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.