SCHEMBL1607663

SCHEMBL1607663

Cc1ccc(S(=O)(=O)O)c(C(C(=O)c2ccccc2)c2ccccc2)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 4/20 0.50
TDP1 Q9NUW8 1/20 0.50
ATM Q13315 1/20 0.41
KMT2A Q03164 4/20 0.40
MEN1 O00255 3/20 0.40
ALDH1A1 P00352 5/20 0.39
MAPT P10636 4/20 0.39
LMNA P02545 4/20 0.38
CES2 O00748 2/20 0.38
CES1 P23141 2/20 0.38
PTPN1 P18031 1/20 0.37
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
MAPK1 P28482 1/20 0.36
CHRM2 P08172 2/20 0.36
CHRM5 P08912 2/20 0.36
CHRM1 P11229 2/20 0.36
CHRM3 P20309 2/20 0.36
HRH1 P35367 2/20 0.36
ADRB2 P07550 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoin SCHEMBL28200317 0.81 LMNA (0.57) L3MBTL1TDP1ATMKMT2AMEN1
SCHEMBL5189158 0.79 ATM (0.42) L3MBTL1TDP1ATMKMT2AMEN1
SCHEMBL2928039 0.74 L3MBTL1 (0.77) L3MBTL1TDP1KMT2AMEN1ALDH1A1
SCHEMBL7597926 0.74 ATM (0.39) L3MBTL1TDP1ATMKMT2AMEN1
SCHEMBL7248678 0.74 LMNA (0.47) L3MBTL1TDP1ATMKMT2AMEN1
SCHEMBL16807284 0.73 L3MBTL1 (0.69) L3MBTL1TDP1KMT2AMEN1ALDH1A1
SCHEMBL3165859 0.73 CYP2D6 (0.41) L3MBTL1ATMKMT2AMEN1ALDH1A1
SCHEMBL776505 0.73 GAA (0.36) L3MBTL1TDP1KMT2AMEN1ALDH1A1
SCHEMBL16807273 0.73 L3MBTL1 (0.62) L3MBTL1TDP1KMT2AMEN1ALDH1A1
SCHEMBL16781997 0.72 L3MBTL1 (0.73) L3MBTL1TDP1KMT2AMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8795951-B2 Material for forming resist sensitization film and production method of semiconductor device FUJITSU LIMITED (JP) 2014-08-05 US disclosed
US-20110081615-A1 MATERIAL FOR FORMING RESIST SENSITIZATION FILM AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-04-07 US disclosed
US-20090130419-A1 FOAM SHEET AND PRODUCTION PROCESS THEREOF OJI PAPER CO., LTD (JP) 2009-05-21 US disclosed
EP-1795553-A1 PROCESS FOR PRODUCING FOAM Oji Paper Co., Ltd. (JP) 2007-06-13 EP disclosed
US-20060210785-A1 Foamed product in a sheet form and method for production thereof OJI PAPER CO., LTD. (JP) 2006-09-21 US disclosed
EP-1647570-A1 FOAMED PRODUCT IN A SHEET FORM AND METHOD FOR PRODUCTION THEREOF Oji Paper Co., Ltd. (JP) 2006-04-19 EP disclosed