SCHEMBL16078201

SCHEMBL16078201

C=C(C)C(=O)OCCOCc1ccc(C(OCCC)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.43
PTPN2 P17706 1/20 0.38
PTPN1 P18031 1/20 0.38
PTPN6 P29350 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
GAA P10253 2/20 0.37
TSHR P16473 3/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
ALDH1A1 P00352 2/20 0.35
KIF11 P52732 1/20 0.35
TDP1 Q9NUW8 2/20 0.35
HTT P42858 2/20 0.35
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
CHRM3 P20309 3/20 0.34
LMNA P02545 2/20 0.34
CYP3A4 P08684 1/20 0.34
MAPK1 P28482 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16081493 0.92 THRB (0.40) THRBPTPN2PTPN1PTPN6GAA
SCHEMBL115658 0.84 KIF11 (0.46) THRBTSHRALDH1A1KIF11TDP1
SCHEMBL316845 0.82 THRB (0.54) THRBSMN1; SMN2TSHRKMT2AALDH1A1
SCHEMBL488918 0.81 THRB (0.53) THRBSMN1; SMN2TSHRKMT2AALDH1A1
SCHEMBL7563917 0.81 THRB (0.59) THRBPTPN2PTPN1PTPN6SMN1; SMN2
Methacrylic Acid SCHEMBL28158161 0.80 THRB (0.51) THRBSMN1; SMN2TSHRKMT2AALDH1A1
SCHEMBL2602455 0.79 THRB (0.49) THRBSMN1; SMN2GAATSHRALDH1A1
SCHEMBL24312367 0.79 TDP1 (0.48) THRBTSHRKIF11TDP1HTT
SCHEMBL28173347 0.79 TDP1 (0.51) THRBTSHRKIF11TDP1HTT
SCHEMBL8016861 0.77 THRB (0.49) THRBSMN1; SMN2TSHRKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999623-B2 Degradable neutral layers for block copolymer lithography applications WISCOUSIN ALUMNI RESEARCH FOUNDATION (US) 2015-04-07 US disclosed
US-20140263164-A1 DEGRADABLE NEUTRAL LAYERS FOR BLOCK COPOLYMER LITHOGRAPHY APPLICATIONS WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2014-09-18 US disclosed