SCHEMBL1609095

SCHEMBL1609095

CCOCC(O[SiH3])OCC

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.35
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL277640 0.84 THRB (0.42) THRBLMNA
SCHEMBL27617519 0.80
SCHEMBL23581082 0.79 THRB (0.38) THRBLMNA
SCHEMBL3985906 0.77 THRB (0.36) THRBLMNA
SCHEMBL3920740 0.76 ALDH1A1 (0.33) THRBLMNA
SCHEMBL1608795 0.76
SCHEMBL854693 0.75 THRB (0.44) THRBLMNA
SCHEMBL14633846 0.73 THRB (0.33) THRBLMNA
SCHEMBL29195105 0.73 HSD17B10 (0.34) THRBLMNA
SCHEMBL15414786 0.73 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 113 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115491002-B PET composite board and preparation method thereof 深圳力越新材料有限公司 2023-10-27 CN claimed
CN-113637173-B Modified sulfydryl-containing liquid silicone resin, nontoxic, colorless and odorless photocuring liquid silicone rubber, and preparation methods and applications thereof 深圳先进技术研究院 2022-12-20 CN claimed
CN-113637173-A Modified sulfydryl-containing liquid silicone resin, nontoxic, colorless and odorless photocuring liquid silicone rubber, and preparation method and application thereof 深圳先进技术研究院 2021-11-12 CN claimed
CN-118599120-B Method for preparing high-quality dimethyl silicone oil 江西蓝星星火有机硅有限公司 2026-05-15 CN disclosed
CN-118599120-A Method for preparing high-quality dimethyl silicone oil 江西蓝星星火有机硅有限公司 2024-09-06 CN disclosed
CN-116075368-B Resin composition, cured product, method for producing same, and laminate 三菱化学株式会社 2024-06-11 CN disclosed
US-11912889-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-27 US disclosed
CN-115491002-B PET composite board and preparation method thereof 深圳力越新材料有限公司 2023-10-27 CN disclosed
US-20230257503-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE MITSUBISHI CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
EP-4212256-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE Mitsubishi Chemical Corporation (JP) 2023-07-19 EP disclosed
CN-116075368-A Resin composition, cured product, method for producing same, and laminate 三菱化学株式会社 2023-05-05 CN disclosed
US-20060220253-A1 Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device HAMADA YOSHITAKA 2006-10-05 US disclosed
US-7084505-B2 Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-08-01 US disclosed
US-20060141693-A1 Semiconductor multilayer interconnection forming method TOKYO OHKA KOGYO CO., LTD. (JP) 2006-06-29 US disclosed
EP-1566836-A1 SEMICONDUCTOR MULTILAYER INTERCONNECTION FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2005-08-24 EP disclosed
US-20050112383-A1 Undercoating layer material for lithography and wiring forming method using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2005-05-26 US disclosed
US-20050074695-A1 Undercoating material for wiring, embedded material, and wiring formation method TOKYO OHKA KOGYO CO., LTD. (JP) 2005-04-07 US disclosed
US-20040188846-A1 Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device PANASONIC CORPORATION (JP) 2004-09-30 US disclosed
US-20040121937-A1 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith TOKYO OHKA KOGYO CO., LTD. (JP) 2004-06-24 US disclosed
US-4831091-A USING A COORDINATION CATALYST CONTAINING A SILANETRIOL OR -DIOL AS WELL AS AN AROMATIC ESTSER; ODORLESS; STEREOSPECIFIC; PARTICLE SIZES CHISSO CORPORATION (JP) 1989-05-16 US disclosed