Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 5/20 | 0.49 |
| ▸ | MTNR1B | P49286 | 5/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.40 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.39 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.39 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1614836 | 1.00 | MTNR1A (0.49) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL1614325 | 1.00 | MTNR1A (0.49) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL16451099 | 0.96 | MTNR1A (0.53) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL896831 | 0.87 | MTNR1A (0.53) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL896674 | 0.87 | MTNR1A (0.53) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL9915776 | 0.84 | MTNR1A (0.42) | MTNR1AMTNR1BLMNAELANEPOLB | |
| SCHEMBL14173290 | 0.84 | ACACB (0.47) | MTNR1AMTNR1BLMNAADRB2ADRB1 | |
| SCHEMBL14173282 | 0.84 | ACACB (0.47) | MTNR1AMTNR1BLMNAADRB2ADRB1 | |
| SCHEMBL31293861 | 0.83 | TDP1 (0.48) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL4191438 | 0.82 | L3MBTL1 (0.41) | MTNR1AMTNR1BLMNAPOLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9417522-B2 | Photosensitive resin composition and method for producing resist pattern | JSR CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20150185604-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | JSR CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-8178279-B2 | Negative radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-15 | — | — | US | disclosed |
| US-20110086938-A1 | NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-04-14 | — | — | US | disclosed |
| US-20070231747-A1 | Radiation-sensitive negative resin composition | JSR CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-6197479-B1 | IMAGE REPRODUCIBILITY AND FOR FLEXOGRAPHIC PRINTING PLATES | TORAY INDUSTRIES, INC. (JP) | 2001-03-06 | — | — | US | disclosed |