Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 5/20 | 0.49 |
| ▸ | MTNR1B | P49286 | 5/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.40 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.40 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.39 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.39 |
| ▸ | ELANE | P08246 | 1/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1613767 | 1.00 | MTNR1A (0.49) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL1614325 | 1.00 | MTNR1A (0.49) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL16451099 | 0.96 | MTNR1A (0.53) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL896831 | 0.87 | MTNR1A (0.53) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL896674 | 0.87 | MTNR1A (0.53) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL9915776 | 0.84 | MTNR1A (0.42) | MTNR1AMTNR1BLMNAELANEPOLB | |
| SCHEMBL14173290 | 0.84 | ACACB (0.47) | MTNR1AMTNR1BLMNAADRB2ADRB1 | |
| SCHEMBL14173282 | 0.84 | ACACB (0.47) | MTNR1AMTNR1BLMNAADRB2ADRB1 | |
| SCHEMBL31293861 | 0.83 | TDP1 (0.48) | MTNR1AMTNR1BLMNAMAOAPTGS1 | |
| SCHEMBL4191438 | 0.82 | L3MBTL1 (0.41) | MTNR1AMTNR1BLMNAPOLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9417522-B2 | Photosensitive resin composition and method for producing resist pattern | JSR CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20150185604-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | JSR CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-8859633-B2 | Adherent composition and method of temporarily fixing member therewith | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8779065-B2 | Fluorine-containing curable resin, active energy beam-curable composition, and cured product thereof | DIC CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20130172476-A1 | FLUORINE-BASED SURFACTANT, AND COATING COMPOSITION AND RESIST COMPOSITION EACH USING THE SAME | DIC CORPORATION (JP) | 2013-07-04 | — | — | US | disclosed |
| EP-1857471-B1 | POLYMERIZATION CATALYST COMPOSITION AND PROCESS FOR PRODUCTION OF POLYMER | MITSUI CHEMICALS INC (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-8178279-B2 | Negative radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-15 | — | — | US | disclosed |
| US-20110265934-A1 | ADHERENT COMPOSITION AND METHOD OF TEMPORARILY FIXING MEMBER THEREWITH | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 2011-11-03 | — | — | US | disclosed |
| US-7960305-B2 | a mixture of a phosphazenium compound such as tetrakis[tris(dimethylamino)phosphoranylideneamino]phosphonium chloride, transition metal halides and an organic halogen compound as an activator, used for addition homo/copolymerization; living polymers | MITSUI CHEMICALS, INC. (JP) | 2011-06-14 | — | — | US | disclosed |
| US-20110086938-A1 | NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-04-14 | — | — | US | disclosed |
| EP-1857471-A1 | POLYMERIZATION CATALYST COMPOSITION AND PROCESS FOR PRODUCTION OF POLYMER | Mitsui Chemicals, Inc. (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070231747-A1 | Radiation-sensitive negative resin composition | JSR CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070066779-A1 | Fluorine-containing photocurable composition | DIC CORPORATION (JP) | 2007-03-22 | — | — | US | disclosed |
| EP-1044989-B1 | Method for preparing polymer | MITSUI CHEMICALS INC (JP) | 2005-06-22 | — | — | EP | disclosed |
| US-6762259-B2 | ACCURATE MOLECULAR WEIGHT CONTROL; POLYMERIZATION OF POLAR UNSATURATED MONOMERS IN PRESENCE OF HYDROXYCARBONYL COMPOUND AND ORGANIC OXYSALT CATALYST | MITSUI CHEMICALS, INC. (JP) | 2004-07-13 | — | — | US | disclosed |
| US-6528599-B1 | Polar unsaturated compound; anionic polymerization | MITSUI CHEMICALS, INC. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20030023003-A1 | Process for the production of living (co)polymers and use of the (co)polymers | MITSUI CHEMICALS, INC. (JP) | 2003-01-30 | — | — | US | disclosed |
| EP-1266910-A1 | PROCESS FOR THE PRODUCTION OF LIVING (CO)POLYMERS AND USE OF THE (CO)POLYMERS | Mitsui Chemicals, Inc. (JP) | 2002-12-18 | — | — | EP | disclosed |
| US-6197479-B1 | IMAGE REPRODUCIBILITY AND FOR FLEXOGRAPHIC PRINTING PLATES | TORAY INDUSTRIES, INC. (JP) | 2001-03-06 | — | — | US | disclosed |
| EP-1044989-A1 | Method for preparing polymer | Mitsui Chemicals, Inc. (JP) | 2000-10-18 | — | — | EP | disclosed |