SCHEMBL1615339

SCHEMBL1615339

Nc1ccc(C(=O)c2cccc(C(=O)c3ccc(N)cc3NC(=O)c3ccccc3)c2)c(NC(=O)c2ccccc2)c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.58
CYP1A2 P05177 3/20 0.58
CYP2C9 P11712 3/20 0.58
CYP2C19 P33261 3/20 0.58
MEN1 O00255 4/20 0.56
KMT2A Q03164 4/20 0.56
PKM P14618 2/20 0.54
GRIK1 P39086 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
HDAC1 Q13547 5/20 0.51
HDAC2 Q92769 3/20 0.51
HDAC3 O15379 2/20 0.51
MAPK1 P28482 1/20 0.51
NPSR1 Q6W5P4 2/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
HSD17B10 Q99714 1/20 0.51
PBRM1 Q86U86 1/20 0.50
LTC4S Q16873 1/20 0.47
KCNK3 O14649 1/20 0.46
KCNK9 Q9NPC2 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29226011 0.85 MAPT (0.61) MAPTCYP1A2CYP2C9CYP2C19MEN1
SCHEMBL7752909 0.82 MAPT (0.68) MAPTCYP1A2CYP2C9CYP2C19MEN1
SCHEMBL14075166 0.80 MAPT (0.57) MAPTCYP1A2CYP2C9CYP2C19MEN1
SCHEMBL8522637 0.80 HDAC2 (0.71) MAPTCYP1A2CYP2C9CYP2C19HDAC1
SCHEMBL29712862 0.80 HDAC2 (0.71) MAPTCYP1A2CYP2C9CYP2C19HDAC1
SCHEMBL29088262 0.78 MAPT (0.65) MAPTCYP1A2CYP2C9CYP2C19MEN1
SCHEMBL5251492 0.77 HDAC1 (0.66) MAPTCYP1A2CYP2C9CYP2C19MEN1
SCHEMBL6485998 0.77 MAPT (0.77) MAPTCYP1A2CYP2C9CYP2C19MEN1
SCHEMBL11431685 0.77 MAPT (0.54) MAPTCYP1A2CYP2C9CYP2C19MEN1
SCHEMBL403486 0.77 HDAC1 (0.66) MAPTCYP1A2CYP2C9CYP2C19MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8778596-B2 Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition DAI NIPPON PRINTING CO., LTD. (JP) 2014-07-15 US disclosed
US-20130309607-A1 PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION DAI NIPPON PRINTING CO., LTD. (JP) 2013-11-21 US disclosed
US-8476444-B2 Base generator DAI NIPPON PRINTING CO., LTD. (JP) 2013-07-02 US disclosed
US-20110086311-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION DAI NIPPON PRINTING CO., LTD. (JP) 2011-04-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110086311-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION RER1, SUN2, LCP1 MAPT 490/4885CYP1A2 3241/4885CYP2C9 2266/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.