⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methane SCHEMBL93251 | 1.00 | — | — | |
| Methane SCHEMBL722104 | 1.00 | — | — | |
| Methane SCHEMBL93252 | 1.00 | — | — | |
| Methane SCHEMBL7898899 | 1.00 | — | — | |
| Methane SCHEMBL21055958 | 1.00 | — | — | |
| Methane SCHEMBL23493562 | 1.00 | — | — | |
| Methane SCHEMBL664518 | 1.00 | — | — | |
| Methane SCHEMBL1305482 | 1.00 | — | — | |
| Methane SCHEMBL3024503 | 1.00 | — | — | |
| Methane SCHEMBL8009844 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116805631-A | Display device, method of manufacturing the same, and tiled display device including the same | 三星显示有限公司 | 2023-09-26 | — | — | CN | claimed |
| CN-116564929-A | Semiconductor structure and forming method thereof | 中芯国际集成电路制造(上海)有限公司 | 2023-08-08 | — | — | CN | claimed |
| US-10692729-B2 | Etching process method | TOKYO ELECTRON LIMITED (JP) | 2020-06-23 | — | — | US | claimed |
| CN-108640980-A | Protein assembly and preparation method thereof | 中国科学院理化技术研究所 | 2018-10-12 | — | — | CN | claimed |
| CN-108531009-A | A kind of valve plate resistant hydrophobic coating material of insulating powder in use and preparation method thereof | 江苏江南绝缘粉末有限公司 | 2018-09-14 | — | — | CN | claimed |
| CN-108075176-A | Fluoride ion battery and its manufacturing method | 丰田自动车株式会社 | 2018-05-25 | — | — | CN | claimed |
| CN-108075177-A | Fluoride ion battery and its manufacturing method | 丰田自动车株式会社 | 2018-05-25 | — | — | CN | claimed |
| US-20170372916-A1 | ETCHING PROCESS METHOD | TOKYO ELECTRON LIMITED (JP) | 2017-12-28 | — | — | US | claimed |
| US-8003487-B2 | Methods of manufacturing a semiconductor device using a layer suspended across a trench | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-08-23 | — | — | US | claimed |
| US-20090162989-A1 | METHODS OF MANUFACTURING A SEMICONDUCTOR DEVICE USING A LAYER SUSPENDED ACROSS A TRENCH | SAMSUNG ELECTRONICS CO. LTD. | 2009-06-25 | — | — | US | claimed |
| EP-0002829-B1 | MEANS FOR THE CONVERSION INTO ENERGY OF THE VARYING CONDITIONS OF TEMPERATURE EXISTANT IN DEEP WATERS, PARTICULARLY THE SEA | Egerer, Paul K. (AT) | 1982-10-13 | — | — | EP | claimed |
| US-4281514-A | Apparatus for the production of energy and method for utilizing the pressure and/or temperature conditions in deep waters | EGERER PAUL K | 1981-08-04 | — | — | US | claimed |
| JP-8293484-A | — | — | None | — | — | JP | disclosed |
| JP-61158143-A | — | — | None | — | — | JP | disclosed |
| JP-63099535-A | — | — | None | — | — | JP | disclosed |
| JP-11135624-A | — | — | None | — | — | JP | disclosed |
| US-4892800-A | STABILITY, HIGH SPEED, GROUP 3 AND/OR GROUP 5 ELEMENT | CANON KABUSHIKI KAISHA (JP) | 1990-01-09 | — | — | US | disclosed |
| JP-S6399535-A | MANUFACTURE OF SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC IND CO LTD | 1988-04-30 | — | — | JP | disclosed |
| JP-S61158143-A | ETCHING METHOD FOR INSULATING FILM | FUJITSU LTD | 1986-07-17 | — | — | JP | disclosed |
| US-4281514-A | Apparatus for the production of energy and method for utilizing the pressure and/or temperature conditions in deep waters | EGERER PAUL K | 1981-08-04 | — | — | US | disclosed |