⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methane SCHEMBL93251 | 1.00 | — | — | |
| Methane SCHEMBL722104 | 1.00 | — | — | |
| Methane SCHEMBL1615574 | 1.00 | — | — | |
| Methane SCHEMBL7898899 | 1.00 | — | — | |
| Methane SCHEMBL21055958 | 1.00 | — | — | |
| Methane SCHEMBL23493562 | 1.00 | — | — | |
| Methane SCHEMBL664518 | 1.00 | — | — | |
| Methane SCHEMBL1305482 | 1.00 | — | — | |
| Methane SCHEMBL3024503 | 1.00 | — | — | |
| Methane SCHEMBL8009844 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 695 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260124578-A1 | METHOD FOR PRODUCING HYDROGEN FLUORIDE ADSORBENT | RESONAC CORPORATION (JP) | 2026-05-07 | — | — | US | claimed |
| EP-4585303-A1 | METHOD FOR PRODUCING HYDROGEN FLUORIDE ADSORBENT | Resonac Corporation (JP) | 2025-07-16 | — | — | EP | claimed |
| US-12106817-B2 | Method for manufacturing a memory | CHANGXIN MEMORY TECHNOLOGIES, INC. (CN) | 2024-10-01 | — | — | US | claimed |
| EP-4092741-B1 | MEMORY MANUFACTURING METHOD AND MEMORY | CHANGXIN MEMORY TECH INC (CN) | 2024-02-14 | — | — | EP | claimed |
| EP-4092741-A1 | MEMORY MANUFACTURING METHOD AND MEMORY | Changxin Memory Technologies, Inc. (CN) | 2022-11-23 | — | — | EP | claimed |
| US-20220319555-A1 | METHOD FOR MANUFACTURING A MEMORY | CHANGXIN MEMORY TECHNOLOGIES, INC. (CN) | 2022-10-06 | — | — | US | claimed |
| US-20210291408-A1 | METHOD OF MANUFACTURING TEMPLATE AND METHOD OF FORMING PATTERN | KIOXIA CORPORATION (JP) | 2021-09-23 | — | — | US | claimed |
| US-20210217853-A1 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) | 2021-07-15 | — | — | US | claimed |
| US-9506154-B2 | Plasma processing method | HITACHI HIGH-TECHNOLOGIES CORPORATION (JP) | 2016-11-29 | — | — | US | claimed |
| US-20160138170-A1 | PLASMA PROCESSING METHOD | HITACHI HIGH-TECH CORPORATION (JP) | 2016-05-19 | — | — | US | claimed |
| US-20110220894-A1 | SEMICONDUCTOR LAYER AND METHOD FOR FORMING SAME | SHARP KABUSHIKI KAISHA (JP) | 2011-09-15 | — | — | US | claimed |
| EP-2357672-A1 | SEMICONDUCTOR LAYER AND METHOD FOR FORMING SAME | Sharp Kabushiki Kaisha (JP) | 2011-08-17 | — | — | EP | claimed |
| US-7390731-B2 | Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate | UNIVERSITE DE NEUCHATEL, INSTITUT DE MICROTECHNIQUE (CH) | 2008-06-24 | — | — | US | claimed |
| EP-1421630-B1 | METHOD OF DEPOSITING AN OXIDE LAYER ON A SUBSTRATE AND A PHOTOVOLTAIC CELL USING SAID SUBSTRATE | UNIV NEUCHATEL (CH) | 2006-10-18 | — | — | EP | claimed |
| US-6869732-B2 | Glass substrate for photomasks and preparation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-22 | — | — | US | claimed |
| US-6855908-B2 | Glass substrate and leveling thereof | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-02-15 | — | — | US | claimed |
| US-20040235286-A1 | Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate | UNIVERSITE DE NEUCHATEL, INSTITUT DE MICROTECHNIQUE (CH) | 2004-11-25 | — | — | US | claimed |
| WO-1999032843-A1 | PROCESS FOR SEPARATING AND PURIFYING FLUORINE COMPOUNDS, AND INSTALLATION THEREOF | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 1999-07-01 | — | — | WO | claimed |
| EP-0924485-A1 | Process for separating and puryfying fluorine compounds, and installation thereof | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 1999-06-23 | — | — | EP | claimed |
| US-5479875-A | MICROWAVE PLASMA VAPOR DEPOSITION, NUCLEATION | KABUSHIKI KAISHA KOBE SEIKO SHO (JP) | 1996-01-02 | — | — | US | claimed |