⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methane SCHEMBL93251 | 1.00 | — | — | |
| Methane SCHEMBL722104 | 1.00 | — | — | |
| Methane SCHEMBL1615574 | 1.00 | — | — | |
| Methane SCHEMBL93252 | 1.00 | — | — | |
| Methane SCHEMBL7898899 | 1.00 | — | — | |
| Methane SCHEMBL21055958 | 1.00 | — | — | |
| Methane SCHEMBL23493562 | 1.00 | — | — | |
| Methane SCHEMBL1305482 | 1.00 | — | — | |
| Methane SCHEMBL3024503 | 1.00 | — | — | |
| Methane SCHEMBL8009844 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 555 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118226706-A | Hot embossing template for large-scale batch preparation of surface periodic ordered array structure | 南京大学 | 2024-06-21 | — | — | CN | claimed |
| WO-2024117980-A1 | COMPOUNDS FOR MODULATING SRC FAMILY KINASES AND USES THEREOF | NATIONAL UNIVERSITY OF SINGAPORE (SG) | 2024-06-06 | — | — | WO | claimed |
| CN-117672913-A | Process chamber, warming method thereof, semiconductor device and storage medium | 北京北方华创微电子装备有限公司 | 2024-03-08 | — | — | CN | claimed |
| CN-114890928-B | Isothiocyanate derivative and preparation method and application thereof | 厦门倍博特医学科技有限公司 | 2024-02-23 | — | — | CN | claimed |
| CN-114890928-A | Isothiocyanate derivative and preparation method and application thereof | 厦门倍博特医学科技有限公司 | 2022-08-12 | — | — | CN | claimed |
| US-11380586-B2 | Cutting method | IWATANI CORPORATION (JP) | 2022-07-05 | — | — | US | claimed |
| CN-114152695-A | Method and system for analyzing component content of mixed gas in gas insulated combined electrical system | 国网黑龙江省电力有限公司电力科学研究院 | 2022-03-08 | — | — | CN | claimed |
| WO-2021015128-A1 | METHOD FOR OPERATING REFRIGERANT CIRCULATION SYSTEM | ＥＮＥＯＳ株式会社 | 2021-01-28 | — | — | WO | claimed |
| WO-2021005983-A1 | WORKING FLUID COMPOSITION FOR REFRIGERATOR, REFRIGERATOR OIL AND REFRIGERATOR | ＪＸＴＧエネルギー株式会社 | 2021-01-14 | — | — | WO | claimed |
| WO-2021005986-A1 | WORKING FLUID COMPOSITION FOR REFRIGERATOR, AND REFRIGERATOR OIL | ＪＸＴＧエネルギー株式会社 | 2021-01-14 | — | — | WO | claimed |
| US-6015730-A | Integration of SAC and salicide processes by combining hard mask and poly definition | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY (TW) | 2000-01-18 | — | — | US | claimed |
| US-6001268-A | REACTIVE ION ETCH PATTERNING THE CERAMIC SLIDER USING AN ETCHANT GAS OF ARGON, METHYL TRIFLUORIDE, AND SULFUR HEXAFLUORIDE AND FLOWED AT A RATE WHICH PROVIDES A SMOOTH SURFACE ON THE CERAMIC SLIDER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-12-14 | — | — | US | claimed |
| US-5994229-A | Achievement of top rounding in shallow trench etch | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) | 1999-11-30 | — | — | US | claimed |
| WO-1999039382-A1 | PROCESS FOR ASHING ORGANIC MATERIALS FROM SUBSTRATES | ANON, INC. (US) | 1999-08-05 | — | — | WO | claimed |
| WO-1999032843-A1 | PROCESS FOR SEPARATING AND PURIFYING FLUORINE COMPOUNDS, AND INSTALLATION THEREOF | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 1999-07-01 | — | — | WO | claimed |
| EP-0924485-A1 | Process for separating and puryfying fluorine compounds, and installation thereof | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 1999-06-23 | — | — | EP | claimed |
| EP-0875888-A1 | Optical recording medium and recording and/or reproduction method using the same | Ricoh Company, Ltd. (JP) | 1998-11-04 | — | — | EP | claimed |
| US-5652171-A | Method of manufacturing semiconductor device having capacitor | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1997-07-29 | — | — | US | claimed |
| EP-0725430-A2 | Method of manufacturing semiconductor device having capacitor | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-08-07 | — | — | EP | claimed |
| EP-0644584-A1 | Improvement on selectivity in etching an oxidation film in a method for fabricating a semiconductor device | NEC CORPORATION (JP) | 1995-03-22 | — | — | EP | claimed |