SCHEMBL16162172

SCHEMBL16162172

NC1(Nc2ccccc2)CCc2ccccc21

nearest known ligand 0.43

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM1A O60341 5/20 0.43
MAOB P27338 1/20 0.43
HDAC9 Q9UKV0 1/20 0.40
TSHR P16473 2/20 0.36
SIGMAR1 Q99720 2/20 0.36
ALDH1A1 P00352 1/20 0.36
TP53 P04637 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
HTR2A P28223 1/20 0.35
HCAR2 Q8TDS4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29784907 0.74 KDM1A (0.53) KDM1AMAOBHDAC9TSHRSIGMAR1
SCHEMBL6267106 0.74 KDM1A (0.53) KDM1AMAOBHDAC9TSHRSIGMAR1
Hydrochloric Acid SCHEMBL29189207 0.72 KDM1A (0.52) KDM1AMAOBHDAC9TSHRSIGMAR1
SCHEMBL8457160 0.71 HDAC9 (0.43) KDM1AMAOBHDAC9TSHRSIGMAR1
SCHEMBL5807645 0.70 KDM1A (0.40) KDM1AMAOBSIGMAR1HTR2A
SCHEMBL8518650 0.69 TDP1 (0.43) MAOBTSHRALDH1A1TP53CYP1A2
SCHEMBL16395630 0.68 PDPK1 (0.49) KDM1AMAOB
SCHEMBL8522960 0.68 POLB (0.45) KDM1AHDAC9ALDH1A1CYP1A2CYP3A4
SCHEMBL17941668 0.68 PDPK1 (0.49) KDM1AMAOB
SCHEMBL7619310 0.68 KDM1A (0.47) KDM1AMAOBHDAC9TSHRSIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110105757-B Porous polyimide film blank film, method for producing same, and composition 东京应化工业株式会社 2023-04-25 CN claimed
CN-114008525-B Method for producing purified resist composition, method for forming resist pattern, and purified resist composition 东京应化工业株式会社 2025-05-23 CN disclosed
CN-119552505-A Composition for producing porous film, method for producing porous film, and porous film 东京应化工业株式会社 2025-03-04 CN disclosed
CN-119503513-A Winding device, film winding method, and method for producing porous imide resin film 东京应化工业株式会社 2025-02-25 CN disclosed
CN-119503516-A Slitting machine and system for manufacturing porous imide resin film 东京应化工业株式会社 2025-02-25 CN disclosed
CN-118440497-A Composition for producing porous film, method for producing porous film, and porous film 东京应化工业株式会社 2024-08-06 CN disclosed
CN-117839447-A Porous film 东京应化工业株式会社 2024-04-09 CN disclosed
US-20240084091-A1 POROUS FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2024-03-14 US disclosed
EP-4327919-A1 POROUS FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-28 EP disclosed
CN-111378198-B Method for producing porous film, method for producing composition for producing porous film, and porous film 东京应化工业株式会社 2024-01-12 CN disclosed
CN-104126240-B Secondary lithium batteries barrier film and manufacture method thereof 公立大学法人首都大学东京 2016-10-05 CN disclosed
US-20160185932-A1 PRODUCTION METHOD FOR POROUS POLYIMIDE RESIN FILM, POROUS POLYIMIDE RESIN FILM, AND SEPARATOR EMPLOYING SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2016-06-30 US disclosed
EP-3029093-A1 PRODUCTION METHOD FOR POROUS POLYIMIDE RESIN FILM, POROUS POLYIMIDE RESIN FILM, AND SEPARATOR EMPLOYING SAME Tokyo Ohka Kogyo Co., Ltd. (JP) 2016-06-08 EP disclosed
US-20160111695-A1 METHOD FOR MANUFACTURING SECONDARY BATTERY SEPARATOR AND METHOD FOR MANUFACTURING LITHIUM SECONDARY BATTERY TOKYO METROPOLITAN UNIVERSITY (JP) 2016-04-21 US disclosed
CN-105452356-A Production method for porous polyimide resin film, porous polyimide resin film, and separator employing same TOKYO OHKA KOGYO CO LTD 2016-03-30 CN disclosed
US-20160072110-A1 METHOD FOR PRODUCING POROUS POLYIMIDE FILM, POROUS POLYIMIDE FILM AND SEPARATOR USING SAME TOKYO OHKA KOGYO CO.,LTD. (JP) 2016-03-10 US disclosed
EP-2990199-A1 METHOD FOR PRODUCING POROUS POLYIMIDE FILM, POROUS POLYIMIDE FILM AND SEPARATOR USING SAME Tokyo Ohka Kogyo Co., Ltd. (JP) 2016-03-02 EP disclosed
CN-104853919-A Method for producing porous polyimide film, and separator using porous polyimide film TOKYO OHKA KOGYO CO LTD 2015-08-19 CN disclosed
US-20140329130-A1 LITHIUM SECONDARY BATTERY SEPARATOR AND METHOD OF MANUFACTURING SAME TOKYO METROPOLITAN PUBLIC UNIVERSITY CORPORATION (JP) 2014-11-06 US disclosed
EP-2790248-A1 LITHIUM SECONDARY BATTERY SEPARATOR AND METHOD OF MANUFACTURING SAME Tokyo Metropolitan University (JP) 2014-10-15 EP disclosed