SCHEMBL16196017

SCHEMBL16196017

CC[N+]1(C)CCCC1.CC[N+]1(C)CCCC1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)[O-]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL2833364 0.87 ACHE (0.33)
Trifluoromethanesulfonic Acid SCHEMBL17179964 0.85 TSHR (0.33)
SCHEMBL14118971 0.81 BBOX1 (0.32)
Sulfuric Acid SCHEMBL17102670 0.80 BBOX1 (0.34)
SCHEMBL15670959 0.79 CA2 (0.33)
SCHEMBL14118616 0.79 TSHR (0.35)
Sulfuric Acid SCHEMBL17102587 0.78 TSHR (0.37)
Sulfuric Acid SCHEMBL21195060 0.78 BBOX1 (0.33)
SCHEMBL14836885 0.78 BBOX1 (0.33)
SCHEMBL5322934 0.77 BBOX1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140322457-A1 ADHESIVE COMPOSITION, ADHESIVE LAYER, POLARIZING FILM HAVING ADHESIVE AGENT LAYER, AND IMAGE FORMING DEVICE NITTO DENKO CORPORATION (JP) 2014-10-30 US disclosed