SCHEMBL16200869

SCHEMBL16200869

Cc1ccc2c(c1)Oc1cc(O)ccc1C21c2ccccc2Cc2ccccc21

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FTO Q9C0B1 3/20 0.43
HPGD P15428 2/20 0.43
MAPT P10636 2/20 0.43
MEN1 O00255 1/20 0.43
CYP2C19 P33261 1/20 0.43
HTT P42858 1/20 0.43
RECQL P46063 1/20 0.43
BLM P54132 1/20 0.43
SMAD3 P84022 1/20 0.43
KMT2A Q03164 1/20 0.43
PRMT1 Q99873 1/20 0.43
ACE2 Q9BYF1 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
DRD1 P21728 11/20 0.40
DRD2 P14416 10/20 0.40
DRD5 P21918 9/20 0.40
DRD3 P35462 8/20 0.40
DRD4 P21917 7/20 0.40
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16203610 0.92 HPGD (0.49) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL16200872 0.87 MAPT (0.48) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL16200994 0.85 FTO (0.52) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL16200969 0.82 MAPT (0.44) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL16200995 0.81 FTO (0.43) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL16200992 0.80 FTO (0.43) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL24401887 0.79 FTO (0.47) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL24401902 0.79 FTO (0.47) FTOHPGDMAPTMEN1CYP2C19
SCHEMBL16200917 0.78 SIRT2 (0.34) MAPTDRD1DRD2DRD5DRD3
SCHEMBL16203608 0.77 FTO (0.55) FTOHPGDMAPTMEN1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170495-B2 Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same DONGJIN SEMICHEM CO., LTD. (KR) 2015-10-27 US disclosed
US-20140319097-A1 PHENOL MONOMER, POLYMER FOR FORMING A RESIST UNDERLAYER FILM INCLUDING SAME, AND COMPOSITION FOR A RESIST UNDERLAYER FILM INCLUDING SAME DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-30 US disclosed