SCHEMBL16200872

SCHEMBL16200872

Cc1ccc2c(c1)Oc1cc(O)ccc1C21c2ccccc2Oc2ccccc21

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.48
FTO Q9C0B1 5/20 0.48
HPGD P15428 2/20 0.48
CYP2C19 P33261 2/20 0.48
MEN1 O00255 2/20 0.48
RECQL P46063 2/20 0.48
KMT2A Q03164 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
HTT P42858 1/20 0.48
BLM P54132 1/20 0.48
SMAD3 P84022 1/20 0.48
PRMT1 Q99873 1/20 0.48
ACE2 Q9BYF1 1/20 0.48
HSD17B10 Q99714 3/20 0.40
ALOX12 P18054 2/20 0.40
ALOX15 P16050 2/20 0.40
ALDH1A1 P00352 1/20 0.40
CYP2C9 P11712 1/20 0.40
BRCA1 P38398 1/20 0.40
LMNA P02545 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16200994 0.91 FTO (0.52) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL16203608 0.90 FTO (0.55) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL19475975 0.90 LMNA (0.42) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL17482941 0.90 FTO (0.55) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL16200969 0.88 MAPT (0.44) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL16200869 0.87 FTO (0.43) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL16200995 0.87 FTO (0.43) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL16200992 0.86 FTO (0.43) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL24969319 0.84 PDK2 (0.44) MAPTFTOHPGDCYP2C19MEN1
SCHEMBL22652729 0.81 PDK2 (0.49) MAPTFTOHPGDCYP2C19MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170495-B2 Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same DONGJIN SEMICHEM CO., LTD. (KR) 2015-10-27 US disclosed
US-20140319097-A1 PHENOL MONOMER, POLYMER FOR FORMING A RESIST UNDERLAYER FILM INCLUDING SAME, AND COMPOSITION FOR A RESIST UNDERLAYER FILM INCLUDING SAME DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-30 US disclosed