SCHEMBL16200992

SCHEMBL16200992

Cc1ccc2c(c1)Oc1cc(O)ccc1C2(c1ccccc1)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FTO Q9C0B1 6/20 0.43
MAPT P10636 3/20 0.43
HPGD P15428 2/20 0.43
CYP2C19 P33261 2/20 0.43
HTT P42858 2/20 0.43
MEN1 O00255 1/20 0.43
RECQL P46063 1/20 0.43
BLM P54132 1/20 0.43
SMAD3 P84022 1/20 0.43
KMT2A Q03164 1/20 0.43
PRMT1 Q99873 1/20 0.43
ACE2 Q9BYF1 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
ALOX12 P18054 3/20 0.42
ALDH1A1 P00352 1/20 0.42
CYP2C9 P11712 1/20 0.42
ALOX15 P16050 1/20 0.42
BRCA1 P38398 1/20 0.42
HSD17B10 Q99714 1/20 0.42
LMNA P02545 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14740590 0.91 FTO (0.50) FTOMAPTHPGDCYP2C19HTT
SCHEMBL29452872 0.91 FTO (0.50) FTOMAPTHPGDCYP2C19HTT
SCHEMBL16200872 0.86 MAPT (0.48) FTOMAPTHPGDCYP2C19HTT
SCHEMBL16200994 0.84 FTO (0.52) FTOMAPTHPGDCYP2C19HTT
SCHEMBL16200969 0.81 MAPT (0.44) FTOMAPTHPGDCYP2C19HTT
SCHEMBL16200869 0.80 FTO (0.43) FTOMAPTHPGDCYP2C19HTT
SCHEMBL16200995 0.80 FTO (0.43) FTOMAPTHPGDCYP2C19HTT
SCHEMBL11312813 0.79 HPGD (0.41) FTOMAPTHPGDCYP2C19HTT
SCHEMBL9810556 0.78 FTO (0.48) FTOMAPTHPGDCYP2C19HTT
SCHEMBL23861366 0.77 FTO (0.40) FTOMAPTHPGDCYP2C19HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9170495-B2 Phenol monomer, polymer for forming a resist underlayer film including same, and composition for a resist underlayer film including same DONGJIN SEMICHEM CO., LTD. (KR) 2015-10-27 US disclosed
US-20140319097-A1 PHENOL MONOMER, POLYMER FOR FORMING A RESIST UNDERLAYER FILM INCLUDING SAME, AND COMPOSITION FOR A RESIST UNDERLAYER FILM INCLUDING SAME DONGJIN SEMICHEM CO., LTD. (KR) 2014-10-30 US disclosed