SCHEMBL16218322

SCHEMBL16218322

C=CCOc1cc(OC=C)c2cc1C(c1ccc(C3CCCCC3)cc1)c1cc(c(OCC=C)cc1OCC=C)C(c1ccc(C3CCCCC3)cc1)c1cc(c(OC=C)cc1OCC=C)C(c1ccc(C3CCCCC3)cc1)c1cc(c(OC=C)cc1OC=C)C2c1ccc(C2CCCCC2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDE4A P27815 1/20 0.36
PDE4B Q07343 1/20 0.36
PDE4C Q08493 1/20 0.36
PDE4D Q08499 1/20 0.36
HTR2C P28335 8/20 0.36
HTR2A P28223 6/20 0.36
HTR2B P41595 6/20 0.36
KCNH2 Q12809 3/20 0.36
ADRB2 P07550 2/20 0.36
HTR1A P08908 2/20 0.36
CHRM5 P08912 2/20 0.36
ADRA2A P08913 2/20 0.36
DRD2 P14416 2/20 0.36
ADRA2B P18089 2/20 0.36
ADRA2C P18825 2/20 0.36
DRD4 P21917 2/20 0.36
HRH2 P25021 2/20 0.36
SLC6A4 P31645 2/20 0.36
HTR7 P34969 2/20 0.36
DRD3 P35462 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16221628 0.88 PDE4B (0.43) PDE4APDE4BPDE4CPDE4DHTR2C
SCHEMBL16218323 0.79 HTR2C (0.36) PDE4APDE4BPDE4CPDE4DHTR2C
SCHEMBL5210690 0.75 ACMSD (0.47) PDE4APDE4BPDE4CPDE4DNPC1
SCHEMBL2586831 0.72 NPC1 (0.54) KCNH2HRH3NPC1MAPTRAB9A
SCHEMBL16222135 0.71 ACMSD (0.35) MAPTRAB9ABACE1
SCHEMBL16221631 0.68 PDE4A (0.40) PDE4APDE4BPDE4CPDE4DHTR2C
SCHEMBL16221932 0.68 ACMSD (0.34) PDE4APDE4BPDE4CPDE4DMAPT
SCHEMBL2586793 0.67 HRH3 (0.44) KCNH2HRH3NPC1MAPTRAB9A
SCHEMBL19986350 0.67 CYP3A4 (0.37) PDE4APDE4BPDE4CPDE4DHTR2C
SCHEMBL31267631 0.66 HTR2C (0.42) HTR2CADRA2ADRD2ADRA2BADRA2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140329177-A1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-11-06 US disclosed