SCHEMBL16243602

SCHEMBL16243602

C=C(C)C(=O)OCCOC(=O)c1ccc(C(=O)O)c2ccccc12

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.44
TDP1 Q9NUW8 3/20 0.44
POLB P06746 1/20 0.44
APEX1 P27695 1/20 0.44
HTT P42858 1/20 0.44
ALDH1A1 P00352 5/20 0.41
THRB P10828 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.40
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
TP53 P04637 2/20 0.39
CYP3A4 P08684 2/20 0.39
MAPK1 P28482 2/20 0.39
NPC1 O15118 2/20 0.38
HPGD P15428 2/20 0.38
RAB9A P51151 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
HSD17B10 Q99714 2/20 0.38
GLA P06280 1/20 0.38
HIF1A Q16665 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16243791 0.94 TDP1 (0.48) TSHRTDP1POLBAPEX1HTT
SCHEMBL10064079 0.87 KDM4E (0.45) TSHRTDP1POLBAPEX1HTT
SCHEMBL4783599 0.87 TSHR (0.56) TSHRTDP1POLBAPEX1HTT
SCHEMBL36715 0.87 TSHR (0.56) TSHRTDP1POLBAPEX1HTT
SCHEMBL29366686 0.87 TSHR (0.56) TSHRTDP1POLBAPEX1HTT
SCHEMBL28190689 0.85 TSHR (0.54) TSHRTDP1POLBAPEX1HTT
SCHEMBL2859734 0.85 TSHR (0.54) TSHRTDP1POLBAPEX1HTT
SCHEMBL16243474 0.85 MAPK1 (0.45) TSHRTDP1POLBAPEX1HTT
Methacrylic Acid SCHEMBL14800721 0.84 TSHR (0.53) TSHRTDP1POLBAPEX1HTT
SCHEMBL14001888 0.84 TSHR (0.45) TSHRTDP1POLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed