SCHEMBL10064079

SCHEMBL10064079

C=C(C)C(=O)OCCOC(=O)c1ccc(O)c2ccccc12

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.45
KDM4A O75164 1/20 0.45
KDM4C Q9H3R0 1/20 0.45
TSHR P16473 6/20 0.43
TDP1 Q9NUW8 3/20 0.42
SERPINE1 P05121 1/20 0.42
ALDH1A1 P00352 2/20 0.41
THRB P10828 1/20 0.41
CDC25B P30305 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
POLB P06746 2/20 0.39
MAPT P10636 1/20 0.39
CA1 P00915 2/20 0.38
CA2 P00918 2/20 0.38
TP53 P04637 1/20 0.38
CYP3A4 P08684 1/20 0.38
MAPK1 P28482 1/20 0.38
APEX1 P27695 1/20 0.37
HTT P42858 1/20 0.37
LMNA P02545 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10040387 0.92 CDC25B (0.46) KDM4EKDM4AKDM4CTSHRTDP1
SCHEMBL16243602 0.87 TSHR (0.44) KDM4EKDM4AKDM4CTSHRTDP1
SCHEMBL18906154 0.85 KDM4E (0.40) KDM4EKDM4AKDM4CTSHRTDP1
SCHEMBL14001888 0.83 TSHR (0.45) KDM4EKDM4AKDM4CTSHRTDP1
SCHEMBL961274 0.82 TDP1 (0.63) TSHRTDP1SERPINE1ALDH1A1THRB
SCHEMBL16243791 0.82 TDP1 (0.48) KDM4EKDM4AKDM4CTSHRTDP1
SCHEMBL129437 0.82 TSHR (0.62) TSHRTDP1ALDH1A1THRBL3MBTL1
SCHEMBL5030862 0.82 HRH3 (0.53) KDM4ETSHRTDP1ALDH1A1CDC25B
SCHEMBL25748803 0.82 THRB (0.41) KDM4ETSHRTDP1ALDH1A1THRB
SCHEMBL26312591 0.82 TSHR (0.47) KDM4ETSHRTDP1ALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-8623590-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-01-07 US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed
US-20120108043-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-05-03 US disclosed