SCHEMBL16247754

SCHEMBL16247754

CC(OCCOC(=O)c1ccccc1)C(C)(C)C

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.57
TDP1 Q9NUW8 4/20 0.56
MAPK1 P28482 1/20 0.50
HIF1A Q16665 1/20 0.50
PKM P14618 1/20 0.49
ADRB2 P07550 2/20 0.49
ADRB1 P08588 2/20 0.49
ADRB3 P13945 2/20 0.49
ALDH1A1 P00352 2/20 0.49
ESR1 P03372 1/20 0.46
ESR2 Q92731 1/20 0.46
TSHR P16473 2/20 0.46
SLC6A3 Q01959 2/20 0.46
SLC6A2 P23975 1/20 0.46
KMT2A Q03164 1/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
HTR1A P08908 1/20 0.46
CYP2D6 P10635 1/20 0.46
SCN1A P35498 1/20 0.46
SCN5A Q14524 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2695470 0.85 LMNA (0.62) LMNATDP1MAPK1HIF1APKM
SCHEMBL11504374 0.82 LMNA (0.59) LMNATDP1MAPK1HIF1APKM
SCHEMBL25267931 0.81 LMNA (0.54) LMNATDP1MAPK1HIF1APKM
SCHEMBL11609605 0.81 LMNA (0.50) LMNATDP1MAPK1HIF1APKM
SCHEMBL21733186 0.81 ALDH1A1 (0.57) LMNATDP1MAPK1HIF1APKM
SCHEMBL137486 0.80 TDP1 (0.83) LMNATDP1MAPK1HIF1AALDH1A1
SCHEMBL25271397 0.80 LMNA (0.57) LMNATDP1MAPK1HIF1APKM
SCHEMBL24325565 0.80 LMNA (0.65) LMNATDP1MAPK1HIF1APKM
SCHEMBL13292516 0.78 TDP1 (0.79) LMNATDP1MAPK1HIF1AALDH1A1
SCHEMBL547137 0.78 TDP1 (0.79) LMNATDP1MAPK1HIF1AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9563121-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition FUJIFILM CORPORATION (JP) 2017-02-07 US disclosed
US-9563121-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition FUJIFILM CORPORATION (JP) 2017-02-07 US disclosed
US-20140342275-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2014-11-20 US disclosed