SCHEMBL16248363

SCHEMBL16248363

CCO[Si](CCCOc1ccc(OCCC[Si](C)(C)C)cc1)(OCC)OCC

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
KDM4E B2RXH2 3/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
NQO1 P15559 1/20 0.40
CYP2D6 P10635 5/20 0.40
CYP3A4 P08684 3/20 0.40
CYP19A1 P11511 5/20 0.38
CYP2C9 P11712 4/20 0.38
CYP2C19 P33261 4/20 0.38
CYP1A2 P05177 3/20 0.38
NPC1 O15118 2/20 0.38
MAPT P10636 2/20 0.38
RAB9A P51151 2/20 0.38
HSD17B10 Q99714 2/20 0.38
LTA4H P09960 2/20 0.38
NR5A1 Q13285 1/20 0.37
TSHR P16473 2/20 0.37
TP53 P04637 1/20 0.37
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16248366 0.88 ALDH1A1 (0.40) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL16248365 0.88 ALDH1A1 (0.40) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL16448439 0.87 ESR1 (0.38) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL10592137 0.84 TDP1 (0.55) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL20226245 0.84 CYP2D6 (0.59) KDM4ESMN1; SMN2CYP2D6CYP3A4CYP19A1
SCHEMBL2579282 0.84 KCNA3 (0.54) ALDH1A1SMN1; SMN2LTA4H
SCHEMBL16448438 0.82 LMNA (0.36) ALDH1A1KDM4ESMN1; SMN2CYP2D6CYP3A4
SCHEMBL16448437 0.82 KDM4E (0.39) ALDH1A1KDM4ESMN1; SMN2NPC1MAPT
SCHEMBL11405912 0.81 MEN1 (0.48) ALDH1A1KDM4ESMN1; SMN2NPC1RAB9A
SCHEMBL27317577 0.81 KDM4E (0.36) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140342289-A1 PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-20 US disclosed