SCHEMBL16248365

SCHEMBL16248365

CCO[Si](C)(CCCOc1ccc(OCCC[Si](OCC)(OCC)OCC)cc1)OCC

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.40
KDM4E B2RXH2 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
NQO1 P15559 1/20 0.39
CYP2D6 P10635 6/20 0.39
CYP3A4 P08684 4/20 0.39
CYP19A1 P11511 7/20 0.38
CYP2C9 P11712 6/20 0.38
CYP2C19 P33261 6/20 0.38
CYP1A2 P05177 5/20 0.38
NPC1 O15118 2/20 0.37
MAPT P10636 2/20 0.37
RAB9A P51151 2/20 0.37
HSD17B10 Q99714 2/20 0.37
LTA4H P09960 3/20 0.37
NR5A1 Q13285 1/20 0.36
LMNA P02545 1/20 0.36
TSHR P16473 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16248363 0.88 ALDH1A1 (0.41) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL16448438 0.87 LMNA (0.36) ALDH1A1KDM4ESMN1; SMN2CYP2D6CYP3A4
SCHEMBL16248366 0.86 ALDH1A1 (0.40) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL16248361 0.86 KDM4E (0.40) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL10961578 0.84 KCNA3 (0.52) ALDH1A1SMN1; SMN2LTA4H
SCHEMBL10592137 0.83 TDP1 (0.55) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL20226245 0.83 CYP2D6 (0.59) KDM4ESMN1; SMN2CYP2D6CYP3A4CYP19A1
SCHEMBL2579282 0.82 KCNA3 (0.54) ALDH1A1SMN1; SMN2LTA4H
SCHEMBL16448439 0.82 ESR1 (0.38) ALDH1A1KDM4ESMN1; SMN2NQO1CYP2D6
SCHEMBL16448440 0.81 KDM4E (0.39) ALDH1A1KDM4ESMN1; SMN2NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140342289-A1 PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-20 US disclosed