SCHEMBL1629142

SCHEMBL1629142

CCCCCCCCCCCCc1ccc(CC(CCCCCC)(C(=O)c2ccc(N3CCOCC3)cc2)N(C)C)cc1

nearest known ligand 0.49

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
THRA P10827 4/20 0.49
THRB P10828 4/20 0.49
S1PR1 P21453 1/20 0.47
LMNA P02545 1/20 0.42
MAPT P10636 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
SLC13A5 Q86YT5 1/20 0.41
CNR1 P21554 1/20 0.40
PLA2G4A P47712 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1629247 0.93 THRA (0.50) THRATHRBS1PR1LMNAMAPT
SCHEMBL8776058 0.91 SMN1; SMN2 (0.43) LMNAMAPTSMN1; SMN2L3MBTL1CNR1
SCHEMBL8900136 0.90 SMN1; SMN2 (0.44) LMNAMAPTSMN1; SMN2L3MBTL1
SCHEMBL1629488 0.89 THRA (0.44) THRATHRBS1PR1LMNAMAPT
SCHEMBL1629276 0.88 MAPT (0.45) THRATHRBLMNAMAPTSMN1; SMN2
SCHEMBL8898042 0.87 SMN1; SMN2 (0.45) LMNAMAPTSMN1; SMN2L3MBTL1
SCHEMBL8900737 0.85 MAPT (0.41) THRATHRBS1PR1LMNAMAPT
SCHEMBL1632618 0.85 MAPT (0.43) THRATHRBLMNAMAPTSMN1; SMN2
SCHEMBL8898680 0.83 MAPT (0.47) LMNAMAPTSMN1; SMN2L3MBTL1SLC13A5
SCHEMBL8900259 0.83 SMN1; SMN2 (0.46) LMNAMAPTSMN1; SMN2L3MBTL1SLC13A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
CN-117471850-A Photosensitive composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-01-30 CN disclosed
CN-115933312-A Colored photosensitive composition, cured product, and image display device 日本化药株式会社 2023-04-07 CN disclosed
CN-112650027-A Method for producing substrate for organic EL panel, and negative photosensitive resin composition 东京应化工业株式会社 2021-04-13 CN disclosed
CN-112147841-A Photosensitive composition, cured product, black matrix, black bank, color filter, image display device, and method for producing patterned cured film 东京应化工业株式会社 2020-12-29 CN disclosed
CN-105467755-B Photosensitive resin composition 东京应化工业株式会社 2020-11-13 CN disclosed
EP-2017311-B1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORP (JP) 2012-11-21 EP disclosed
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US disclosed
US-20090118388-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORPORATION (JP) 2009-05-07 US disclosed
EP-2017311-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR Corporation (JP) 2009-01-21 EP disclosed
US-5629356-A PHOTOCURABLE COMPOSITION CONTAINING ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE COMPOUND AND THE AMINOACETOPHENONE CIBA GEIGY CORPORATION (US) 1997-05-13 US disclosed
US-5554663-A α-aminoacetophenones as photoinitiators CIBA-GEIGY CORPORATION (US) 1996-09-10 US disclosed
US-5534629-A PHOTOPOLYMERIZATION OF PIGMENTED SYSTEMS, INKS CIBA-GEIGY CORPORATION (US) 1996-07-09 US disclosed
EP-0284561-B1 ALPHA-AMINOACETOPHENONES AS PHOTO INITIATORS CIBA-GEIGY AG (CH) 1993-05-12 EP disclosed
US-5077402-A For photocuring pigmented systems; printing inks, lacquers CIBA-GEIGY CORPORATION (US) 1991-12-31 US disclosed
EP-0284561-A2 Alpha-aminoacetophenones as photo initiators CIBA-GEIGY AG (CH) 1988-09-28 EP disclosed