SCHEMBL1629247

SCHEMBL1629247

CCCCCCCCCCCCc1ccc(CC(CC)(C(=O)c2ccc(N3CCOCC3)cc2)N(C)C)cc1

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
THRA P10827 4/20 0.50
THRB P10828 4/20 0.50
S1PR1 P21453 3/20 0.47
LMNA P02545 1/20 0.41
MAPT P10636 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
CNR1 P21554 1/20 0.40
SLC13A5 Q86YT5 1/20 0.40
PLA2G4A P47712 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1629488 0.96 THRA (0.44) THRATHRBS1PR1LMNAMAPT
SCHEMBL1629142 0.93 THRA (0.49) THRATHRBS1PR1LMNAMAPT
SCHEMBL1632618 0.92 MAPT (0.43) THRATHRBLMNAMAPTSMN1; SMN2
SCHEMBL8898680 0.91 MAPT (0.47) LMNAMAPTSMN1; SMN2L3MBTL1SLC13A5
SCHEMBL8899059 0.88 GSK3B (0.45) LMNAMAPTSMN1; SMN2L3MBTL1SLC13A5
SCHEMBL1629303 0.87 MAPT (0.53) LMNAMAPTSMN1; SMN2L3MBTL1SLC13A5
SCHEMBL8897694 0.87 MAPT (0.49) THRATHRBLMNAMAPTSMN1; SMN2
SCHEMBL1629241 0.87 THRA (0.42) THRATHRBS1PR1LMNAMAPT
SCHEMBL20097748 0.86 MAPT (0.48) LMNAMAPTSMN1; SMN2L3MBTL1SLC13A5
SCHEMBL58161 0.86 NPC1 (0.48) LMNAMAPTSMN1; SMN2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
CN-117471850-A Photosensitive composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-01-30 CN disclosed
CN-115933312-A Colored photosensitive composition, cured product, and image display device 日本化药株式会社 2023-04-07 CN disclosed
CN-112650027-A Method for producing substrate for organic EL panel, and negative photosensitive resin composition 东京应化工业株式会社 2021-04-13 CN disclosed
CN-112147841-A Photosensitive composition, cured product, black matrix, black bank, color filter, image display device, and method for producing patterned cured film 东京应化工业株式会社 2020-12-29 CN disclosed
CN-105467755-B Photosensitive resin composition 东京应化工业株式会社 2020-11-13 CN disclosed
EP-2017311-B1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORP (JP) 2012-11-21 EP disclosed
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US disclosed
US-20090118388-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORPORATION (JP) 2009-05-07 US disclosed
EP-2017311-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR Corporation (JP) 2009-01-21 EP disclosed
US-5629356-A PHOTOCURABLE COMPOSITION CONTAINING ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE COMPOUND AND THE AMINOACETOPHENONE CIBA GEIGY CORPORATION (US) 1997-05-13 US disclosed
US-5554663-A α-aminoacetophenones as photoinitiators CIBA-GEIGY CORPORATION (US) 1996-09-10 US disclosed
US-5534629-A PHOTOPOLYMERIZATION OF PIGMENTED SYSTEMS, INKS CIBA-GEIGY CORPORATION (US) 1996-07-09 US disclosed
EP-0284561-B1 ALPHA-AMINOACETOPHENONES AS PHOTO INITIATORS CIBA-GEIGY AG (CH) 1993-05-12 EP disclosed
US-5077402-A For photocuring pigmented systems; printing inks, lacquers CIBA-GEIGY CORPORATION (US) 1991-12-31 US disclosed
EP-0284561-A2 Alpha-aminoacetophenones as photo initiators CIBA-GEIGY AG (CH) 1988-09-28 EP disclosed