SCHEMBL163183

SCHEMBL163183

CCn1c(=O)[nH]c(=O)[nH]c1=O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.47
CYP1A2 P05177 3/20 0.47
KMT2A Q03164 3/20 0.47
MEN1 O00255 2/20 0.47
POLB P06746 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.44
LMNA P02545 1/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2D6 P10635 1/20 0.44
TSHR P16473 1/20 0.44
NFKB1 P19838 1/20 0.44
BLM P54132 1/20 0.44
PMP22 Q01453 1/20 0.44
PDE4A P27815 2/20 0.41
ADORA2A P29274 2/20 0.41
PDE4B Q07343 2/20 0.41
PDE4C Q08493 2/20 0.41
PDE4D Q08499 2/20 0.41
ALDH1A1 P00352 2/20 0.40
GAA P10253 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclopentene SCHEMBL28571370 0.83 ALDH1A1 (0.42) MAPTCYP1A2KMT2AMEN1POLB
Acrylic Acid SCHEMBL4887834 0.82 LMNA (0.37) MAPTCYP1A2KMT2AMEN1POLB
Methacrylic Acid SCHEMBL4249534 0.82 KMT2A (0.36) MAPTCYP1A2KMT2AMEN1POLB
SCHEMBL559878 0.79 MAPT (0.50) MAPTKMT2AMEN1SMN1; SMN2BLM
SCHEMBL633733 0.78 CYP1A2 (0.47) MAPTCYP1A2KMT2AMEN1POLB
SCHEMBL8857844 0.77
SCHEMBL2784423 0.75 ATM (0.53) MAPTKMT2AMEN1LMNATSHR
SCHEMBL923439 0.74 ADORA2A (0.47) MAPTCYP1A2KMT2AMEN1POLB
SCHEMBL12189689 0.74 POLB (0.41) MAPTCYP1A2KMT2AMEN1POLB
SCHEMBL9885874 0.74 ALDH1A1 (0.34) MAPTCYP1A2KMT2AMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 536 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111793201-B Terminal methacryloxy three-arm star polyether bonding agent 西安近代化学研究所 2022-09-20 CN claimed
CN-112904671-A Photosensitive resin composition and insulating film prepared therefrom 罗门哈斯电子材料韩国有限公司 2021-06-04 CN claimed
US-20210149306-A1 PHOTOSENSITIVE RESIN COMPOSITION AND INSULATING LAYER PREPARED THEREFROM ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) 2021-05-20 US claimed
CN-107207448-B Antimicrobial compounds, methods of making the same, and articles comprising the same 医学科技研究公司 2020-12-29 CN claimed
CN-111793201-A Terminal methacryloxy three-arm star polyether bonding agent 西安近代化学研究所 2020-10-20 CN claimed
EP-3681962-A1 ACRYLIC EMULSIONS MODIFIED WITH FUNCTIONAL (METH)ACRYLATES TO ENABLE CROSSLINKING Miwon North America Incorporated (US) 2020-07-22 EP claimed
CN-110272648-A A kind of UV woodwork coating and preparation method thereof using renewable energy raw material 东莞大宝化工制品有限公司 2019-09-24 CN claimed
CN-110072564-A As silane coupling agent for adhesiveness improvement comprising mercaptan, alkene and containing the composition of phosphinic acid compounds 生物医学键合有限公司 2019-07-30 CN claimed
WO-2019075037-A1 ACRYLIC EMULSIONS MODIFIED WITH FUNCTIONAL (METH)ACRYLATES TO ENABLE CROSSLINKING Miwon North America Incorporated (US) 2019-04-18 WO claimed
CN-106810674-B A kind of sulfur-bearing tetraglycidel ether epoxy resin and preparation method thereof 武汉超支化树脂科技有限公司 2019-02-05 CN claimed
US-20130115472-A1 HALOGEN-FREE RESIN COMPOSITION, AND COPPER CLAD LAMINATE AND PRINTED CIRCUIT BOARD USING SAME Elite Material Co., Ltd. (TW) 2013-05-09 US claimed
US-20130075138-A1 HALOGEN-FREE RESIN COMPOSITION AND COPPER CLAD LAMINATE AND PRINTED CIRCUIT BOARD USING SAME Elite Material Co., Ltd. (TW) 2013-03-28 US claimed
US-20130075136-A1 RESIN COMPOSITION AND PREPREG, LAMINATE AND CIRCUIT BOARD THEREOF Elite Material Co., Ltd. (TW) 2013-03-28 US claimed
US-8404764-B1 Resin composition and prepreg, laminate and circuit board thereof Elite Material Co., Ltd. (TW) 2013-03-26 US claimed
WO-2005069734-A2 A LIQUID THERMOSETTING INK PRINTAR LTD. (IL) 2005-08-04 WO claimed
WO-2003083901-A2 NOVEL POLYMER/SUBSTRATE AND POLYMER/POLYMER INTERFACES AND METHODS OF MODELING AND FORMING SAME HONEYWELL INTERNATIONAL INC. (US) 2003-10-09 WO claimed
US-4555532-A DIAMINOTRIAZINE-SUBSTITUTED IMIDAZOLE HARDENER, DICYANDIAMIDE, SOLDER RESISTS HITACHI, LTD. (JP) 1985-11-26 US claimed
EP-0144281-A1 High solids theic polyester enamels ESSEX GROUP INC. (US) 1985-06-12 EP claimed
US-4369207-A PHOTOPOLYMERIZING TEIJIN LIMITED (JP) 1983-01-18 US claimed
US-4281095-A Coating compositions obtained by reacting amino carboxylic acids derivatives with polyisocyanates and compounds containing carboxylic groups to produce polymers containing hydantoin rings and amide groups BAYER AKTIENGESELLSCHAFT (DE) 1981-07-28 US claimed