Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.49 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | GAA | P10253 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.49 |
| ▸ | TSHR | P16473 | 2/20 | 0.49 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.49 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.49 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | ESR1 | P03372 | 1/20 | 0.44 |
| ▸ | CA7 | P43166 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16338634 | 0.87 | LMNA (0.67) | LMNATDP1SMN1; SMN2NPC1RAB9A | |
| SCHEMBL19698074 | 0.85 | CA2 (0.51) | LMNATDP1NPC1RAB9AGAA | |
| SCHEMBL3907608 | 0.85 | L3MBTL1 (0.47) | LMNASMN1; SMN2RAB9AGAAKMT2A | |
| SCHEMBL13268597 | 0.83 | LMNA (0.62) | LMNATDP1SMN1; SMN2NPC1RAB9A | |
| SCHEMBL15070606 | 0.82 | LMNA (0.55) | LMNATDP1SMN1; SMN2NPC1RAB9A | |
| SCHEMBL19698075 | 0.82 | HRH3 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1CA12 | |
| SCHEMBL1224989 | 0.81 | TDP1 (0.62) | LMNATDP1SMN1; SMN2NPC1RAB9A | |
| Ammonia Solution, Strong SCHEMBL28440111 | 0.80 | TDP1 (0.60) | LMNATDP1SMN1; SMN2NPC1RAB9A | |
| Ethyl Benzoate SCHEMBL11149423 | 0.80 | LMNA (0.66) | LMNATDP1SMN1; SMN2NPC1RAB9A | |
| Ethyl Benzoate SCHEMBL25388294 | 0.79 | LMNA (0.70) | LMNATDP1SMN1; SMN2NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10109485-B2 | Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-10-23 | — | — | US | disclosed |
| EP-2826826-B1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2018-08-01 | — | — | EP | disclosed |
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9902875-B2 | Composition for forming a coating type BPSG film, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9880470-B2 | Composition for forming a coating type silicon-containing film, substrate, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-30 | — | — | US | disclosed |
| US-20170154766-A1 | SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-01 | — | — | US | disclosed |
| US-9627204-B2 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-18 | — | — | US | disclosed |
| US-9580623-B2 | Patterning process using a boron phosphorus silicon glass film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-28 | — | — | US | disclosed |
| US-9580623-B2 | Patterning process using a boron phosphorus silicon glass film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20160276152-A1 | PATTERNING PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-09-22 | — | — | US | disclosed |
| US-20160276152-A1 | PATTERNING PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-09-22 | — | — | US | disclosed |
| US-20160229939-A1 | SILICON-CONTAINING POLYMER, SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160096977-A1 | COMPOSITION FOR FORMING A COATING TYPE SILICON-CONTAINING FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| US-20160096978-A1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-07 | — | — | US | disclosed |
| EP-2826826-A1 | Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-01-21 | — | — | EP | disclosed |
| US-20150004791-A1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-01 | — | — | US | disclosed |