Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | FAAH | O00519 | 4/20 | 0.34 |
| ▸ | CNR1 | P21554 | 1/20 | 0.34 |
| ▸ | CNR2 | P34972 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28159164 | 0.98 | ALDH1A1 (0.35) | ALDH1A1FAAHCNR1CNR2LMNA | |
| SCHEMBL5974344 | 0.96 | ALDH1A1 (0.34) | ALDH1A1FAAHCNR1CNR2LMNA | |
| SCHEMBL25284141 | 0.96 | ALDH1A1 (0.34) | ALDH1A1FAAHCNR1CNR2LMNA | |
| SCHEMBL4147702 | 0.96 | ALDH1A1 (0.34) | ALDH1A1FAAHCNR1CNR2LMNA | |
| SCHEMBL6138473 | 0.89 | FFAR3 (0.34) | FAAHCNR1CNR2 | |
| SCHEMBL4138225 | 0.89 | FFAR3 (0.34) | FAAHCNR1CNR2 | |
| SCHEMBL2475707 | 0.83 | ALDH1A1 (0.38) | ALDH1A1FAAHCNR1CNR2LMNA | |
| SCHEMBL28891600 | 0.83 | ALDH1A1 (0.46) | ALDH1A1LMNA | |
| SCHEMBL124651 | 0.81 | ALDH1A1 (0.37) | ALDH1A1FAAHCNR1CNR2LMNA | |
| SCHEMBL30462935 | 0.81 | ALDH1A1 (0.37) | ALDH1A1FAAHCNR1CNR2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |