Naphthalene

Naphthalene

SCHEMBL1637639

CC(C)(C)c1cccc2cc3ccccc3cc12.c1ccc2ccccc2c1.c1ccc2ccccc2c1

nearest known ligand 0.41

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.41
ALDH1A1 P00352 5/20 0.40
KDM4E B2RXH2 2/20 0.40
GAA P10253 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
TSHR P16473 1/20 0.40
KIF11 P52732 1/20 0.39
HSD17B10 Q99714 2/20 0.38
HIF1A Q16665 1/20 0.38
CYP1B1 Q16678 1/20 0.38
NQO1 P15559 1/20 0.38
CYP1A2 P05177 5/20 0.37
HPGD P15428 1/20 0.37
MEN1 O00255 1/20 0.37
MAPT P10636 1/20 0.37
KMT2A Q03164 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CYP2A6 P11509 5/20 0.37
GABRA1 P14867 1/20 0.36
GABRB2 P47870 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29405311 0.98 CA2 (0.43) CA2ALDH1A1KDM4EGAATDP1
SCHEMBL4599393 0.98 CA2 (0.43) CA2ALDH1A1KDM4EGAATDP1
Tert-Butanol SCHEMBL28209873 0.92 CA2 (0.43) CA2ALDH1A1KDM4EGAATDP1
Formaldehyde SCHEMBL28438122 0.92 ALDH1A1 (0.42) CA2ALDH1A1KDM4EGAATDP1
SCHEMBL28423964 0.89 CA2 (0.46) CA2ALDH1A1KDM4EGAATDP1
Hydroquinone SCHEMBL28095978 0.89 CA2 (0.45) CA2ALDH1A1KDM4EGAATDP1
SCHEMBL27661667 0.82 TRPA1 (0.39) CA2ALDH1A1KDM4EGAATDP1
SCHEMBL6135770 0.81 TRPA1 (0.38) CA2ALDH1A1KDM4EGAATDP1
SCHEMBL7951292 0.79 CA2 (0.41) CA2ALDH1A1KDM4ETDP1TSHR
SCHEMBL22288148 0.79 ALDH1A1 (0.39) ALDH1A1KDM4EGAATSHRKIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7931834-B2 Introducing solid particles of cryogenic material into particle formation vessel in contact with target material in liquid state below liquid surface allowing rapid volumetric expansion of cryogenic material into gaseous state and releasing expanded cryogenic material forming liquid droplet particles EASTMAN KODAK COMPANY (US) 2011-04-26 US disclosed
US-20080190323-A1 PROCESS FOR FORMATION AND COLLECTION OF PARTICLES USING CRYOGENIC MATERIAL FPC INC. 2008-08-14 US disclosed
CN-101189357-A Deposition of uniform layer of desired material EASTMAN KODAK CO (US) 2008-05-28 CN disclosed
US-7223445-B2 Process for the deposition of uniform layer of particulate material EASTMAN KODAK COMPANY (US) 2007-05-29 US disclosed
US-20060275542-A1 Deposition of uniform layer of desired material EASTMAN KODAK COMPANY 2006-12-07 US disclosed
US-20060273713-A1 Process for making an organic light-emitting device EASTMAN KODAK COMPANY 2006-12-07 US disclosed
WO-2006130817-A2 DEPOSITION OF UNIFORM LAYER OF DESIRED MATERIAL EASTMAN KODAK COMPANY (US) 2006-12-07 WO disclosed
WO-2005095005-A1 DEPOSITION OF UNIFORM LAYER OF PARTICULATE MATERIAL EASTMAN KODAK COMPANY (US) 2005-10-13 WO disclosed
US-20050221018-A1 Process for the deposition of uniform layer of particulate material EASTMAN KODAK COMPANY 2005-10-06 US disclosed