Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8022701 | 0.79 | — | — | |
| SCHEMBL10707134 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL12094925 | 0.74 | ACHE (0.31) | — | |
| SCHEMBL7644772 | 0.74 | — | — | |
| SCHEMBL17501896 | 0.73 | — | — | |
| SCHEMBL17856781 | 0.71 | — | — | |
| Ether SCHEMBL1638308 | 0.70 | — | — | |
| Trimethylammonium SCHEMBL8993348 | 0.70 | MEN1 (0.30) | MEN1MAPTKMT2A | |
| SCHEMBL6702332 | 0.69 | — | — | |
| Benzene SCHEMBL665216 | 0.66 | ALDH1A1 (0.39) | TSHRKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1783548-B1 | Method of forming a patterned layer on a substrate | ROHM & HAAS ELECT MAT (US) | 2017-03-08 | — | — | EP | disclosed |
| EP-1353228-B1 | Method for forming a relief image using a very thick photoresist layer on a semiconductor wafer and metal plating method | ROHM & HAAS ELECT MAT (US) | 2015-01-28 | — | — | EP | disclosed |
| US-8455175-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-06-04 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| US-20110262861-A1 | PHOTOSENSITIVE COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-10-27 | — | — | US | disclosed |
| US-7932016-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-04-26 | — | — | US | disclosed |
| US-7723850-B2 | Electronic devices having air gaps | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-05-25 | — | — | US | disclosed |
| EP-1510318-B1 | Process for manufacturing polymers | ROHM & HAAS (US) | 2009-07-01 | — | — | EP | disclosed |
| US-7344970-B2 | Plating method | SHIPLEY COMPANY, L.L.C. (US) | 2008-03-18 | — | — | US | disclosed |
| US-20080038518-A1 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2008-02-14 | — | — | US | disclosed |
| CN-1293032-A | Method for preparing ultra-violet absorption composition | ROHM & HAAS (US) | 2001-05-02 | — | — | CN | disclosed |
| EP-1092421-A2 | Method for preparing ultraviolet radiation absorbing compositions | ROHM AND HAAS COMPANY (US) | 2001-04-18 | — | — | EP | disclosed |
| US-5563011-A | WITH TOPCOATING CONTAINING COPOLYMERIC ACRYLIC BINDER, PHOTOACTIVE COMPOUND WHICH GENERATES AN ACID OR BASE WHEN EXPOSED TO ACTIVATING RADIATION AND CROSSLINKING AGENT | SHIPLEY COMPANY INC. (US) | 1996-10-08 | — | — | US | disclosed |
| EP-0490118-A1 | Photoimagable solder mask and photosensitive composition | SHIPLEY COMPANY INC. (US) | 1992-06-17 | — | — | EP | disclosed |
| CN-1048933-A | Utilization contains the method for solid state image of the photohardenable compositions of hollow ball | DU PONT (US) | 1991-01-30 | — | — | CN | disclosed |
| CN-1048935-A | The composition that utilization contains core-shell polymer carries out the method for solid state image | DU PONT (US) | 1991-01-30 | — | — | CN | disclosed |
| US-4877818-A | PHOTORESISTS | ROHM AND HAAS COMPANY (US) | 1989-10-31 | — | — | US | disclosed |
| EP-0176356-B1 | PHOTOSENSITIVE POLYMER COMPOSITIONS, ELECTROPHORETIC DEPOSITION PROCESSES USING SAME, AND THE USE OF SAME IN FORMING FILMS ON SUBSTRATES | ROHM AND HAAS COMPANY (US) | 1988-11-02 | — | — | EP | disclosed |
| US-4592816-A | Forming negative images on conductive surfaces | ROHM AND HAAS COMPANY (US) | 1986-06-03 | — | — | US | disclosed |
| EP-0176356-A2 | Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates | ROHM AND HAAS COMPANY (US) | 1986-04-02 | — | — | EP | disclosed |