Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | TP53 | P04637 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | LTA4H | P09960 | 1/20 | 0.32 |
| ▸ | NQO1 | P15559 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30473468 | 1.00 | ALDH1A1 (0.32) | ALDH1A1TSHRTP53KDM4ENPC1 | |
| SCHEMBL1639726 | 0.89 | ALDH1A1 (0.34) | ALDH1A1TSHRTP53KDM4ENPC1 | |
| SCHEMBL29444227 | 0.85 | CA2 (0.37) | ALDH1A1TSHRTP53KDM4ENPC1 | |
| SCHEMBL818991 | 0.85 | ALDH1A1 (0.44) | ALDH1A1TSHRKDM4ENPC1RAB9A | |
| SCHEMBL1639207 | 0.84 | CYP1A2 (0.34) | MAPT | |
| SCHEMBL27707274 | 0.83 | CA1 (0.44) | ALDH1A1TSHRTP53SMN1; SMN2MAPT | |
| SCHEMBL29444236 | 0.82 | HPGD (0.39) | ALDH1A1TSHRKDM4EHPGDELANE | |
| SCHEMBL27599920 | 0.82 | ALDH1A1 (0.37) | ALDH1A1TP53KDM4ENPC1HPGD | |
| SCHEMBL6850272 | 0.82 | HPGD (0.39) | ALDH1A1TSHRKDM4EHPGDELANE | |
| SCHEMBL19825684 | 0.80 | ALDH1A1 (0.35) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10372039-B2 | Resist underlayer film forming composition containing silicon having ester group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-08-06 | — | — | US | disclosed |
| US-10079146-B2 | Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-09-18 | — | — | US | disclosed |
| US-9817312-B2 | Silicon-containing heat- or photo-curable composition | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) | 2017-11-14 | — | — | US | disclosed |
| US-9494862-B2 | Resist underlayer film forming composition containing silicon having sulfone structure and amine structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-20160266490-A1 | SILICON-CONTAINING HEAT- OR PHOTO-CURABLE COMPOSITION | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2016-09-15 | — | — | US | disclosed |
| US-9290623-B2 | Composition for forming silicon-containing resist underlayer film having cyclic diester group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-22 | — | — | US | disclosed |
| EP-1391476-B1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2015-12-09 | — | — | EP | disclosed |
| US-20150322212-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150316849-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ESTER GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| EP-2916170-A1 | ESTER-GROUP-CONTAINING COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2015-09-09 | — | — | EP | disclosed |
| US-7754330-B2 | Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-13 | — | — | US | disclosed |
| US-20090294922-A1 | ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | PANASONIC CORPORATION (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090294726-A1 | ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-7312013-B2 | Photoreactive composition | SEKISUI CHEMICAL CO., LTD. (JP) | 2007-12-25 | — | — | US | disclosed |
| US-20040202956-A1 | a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-10-14 | — | — | US | disclosed |
| EP-1391476-A1 | PHOTOREACTIVE COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 2004-02-25 | — | — | EP | disclosed |
| EP-1334993-A2 | Proton conducting membrane, method for producing the same, and fuel cell using the same | National Institute of Advanced Industrial Science and Technology (JP) | 2003-08-13 | — | — | EP | disclosed |
| EP-0641820-B1 | Organosilicon polymer and process for the preparation thereof | TOSHIBA SILICONE (JP) | 1998-08-12 | — | — | EP | disclosed |
| US-5489662-A | Process for the preparation of organosilicon polymer | TOSHIBA SILICONE CO., LTD. (JP) | 1996-02-06 | — | — | US | disclosed |
| EP-0641820-A1 | Process for the preparation of organosilicon polymer | TOSHIBA SILICONE CO., LTD. (JP) | 1995-03-08 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150322212-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CYCLIC DIESTER GROUP | ASH2L, SRRM2, CCNT1 | ALDH1A1 2432/4885TSHR 4197/4885TP53 3645/4885 |
| US-20090294922-A1 | ORGANIC SILICON OXIDE FINE PARTICLE AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SPOP, OSTC, SEM1 | ALDH1A1 3005/4885TSHR 4371/4885TP53 1233/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.