SCHEMBL16404689

SCHEMBL16404689

[SiH3]CCc1cccc(Cl)c1Cl

nearest known ligand 0.63

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 5/20 0.63
PNMT P11086 2/20 0.58
IDO1 P14902 3/20 0.50
KDM4E B2RXH2 1/20 0.44
ALDH1A1 P00352 1/20 0.44
POLB P06746 1/20 0.44
CYP2A13 Q16696 2/20 0.42
CYP1A2 P05177 1/20 0.41
GLA P06280 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
TSHR P16473 1/20 0.39
DBH P09172 1/20 0.39
P2RX7 Q99572 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7580328 0.81 PNMT (0.62) TAAR1PNMTIDO1KDM4EALDH1A1
SCHEMBL17552719 0.81 TAAR1 (0.60) TAAR1PNMTIDO1TSHR
SCHEMBL17552721 0.79 TAAR1 (0.39) TAAR1PNMTCYP3A4
SCHEMBL17552732 0.78 TAAR1 (0.39) TAAR1PNMTIDO1CYP1A2GLA
SCHEMBL17552716 0.78 TAAR1 (0.44) TAAR1PNMTIDO1ALDH1A1CYP2A13
SCHEMBL9828207 0.77 TAAR1 (0.63) TAAR1PNMTIDO1KDM4EALDH1A1
SCHEMBL5584502 0.77 TAAR1 (0.63) TAAR1PNMTIDO1KDM4EALDH1A1
SCHEMBL3001711 0.77 TAAR1 (0.63) TAAR1PNMTIDO1KDM4EALDH1A1
SCHEMBL8082929 0.77 TAAR1 (0.63) TAAR1PNMTIDO1KDM4EALDH1A1
SCHEMBL10690855 0.77 TAAR1 (0.63) TAAR1PNMTIDO1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 US disclosed
EP-2826826-A1 Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition Shin-Etsu Chemical Co., Ltd. (JP) 2015-01-21 EP disclosed