SCHEMBL7580328

SCHEMBL7580328

[SiH3]Cc1cccc(Cl)c1Cl

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PNMT P11086 2/20 0.62
TAAR1 Q96RJ0 2/20 0.56
IDO1 P14902 3/20 0.54
KDM4E B2RXH2 1/20 0.47
ALDH1A1 P00352 1/20 0.47
POLB P06746 1/20 0.47
CYP2A13 Q16696 2/20 0.44
TSHR P16473 1/20 0.42
DBH P09172 1/20 0.41
CYP1A2 P05177 2/20 0.40
GLA P06280 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2D6 P10635 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
P2RX7 Q99572 1/20 0.39
CYP2A6 P11509 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
RECQL P46063 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16404689 0.81 TAAR1 (0.63) PNMTTAAR1IDO1KDM4EALDH1A1
SCHEMBL8714613 0.79
SCHEMBL3302008 0.79 PNMT (0.68) PNMTTAAR1IDO1KDM4EALDH1A1
SCHEMBL17552713 0.78 PNMT (0.43) PNMTTAAR1IDO1TSHRCYP1A2
SCHEMBL42705 0.77 PNMT (1.00) PNMTTAAR1IDO1KDM4EALDH1A1
SCHEMBL17552708 0.77 CYP3A4 (0.40) PNMTTAAR1IDO1CYP3A4CYP2A6
SCHEMBL283449 0.77 PNMT (0.65) PNMTTAAR1IDO1KDM4EALDH1A1
SCHEMBL17552715 0.76 TAAR1 (0.38) PNMTTAAR1IDO1ALDH1A1CYP2A13
SCHEMBL1145379 0.75 IDO1 (0.65) PNMTTAAR1IDO1KDM4EALDH1A1
SCHEMBL1547863 0.75 PNMT (0.62) PNMTTAAR1IDO1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0130338-B1 RESIST STRUCTURE AND PROCESSES FOR MAKING AND PATTERNING IT International Business Machines Corporation (US) 1988-05-04 EP claimed
EP-0130338-A2 Resist structure and processes for making and patterning it International Business Machines Corporation (US) 1985-01-09 EP claimed
US-4464460-A Process for making an imaged oxygen-reactive ion etch barrier INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1984-08-07 US claimed
EP-4698583-A1 PREPARATION OF AN ALKOXY- OR HYDROXY-TERMINATED POLY(PHENYLMETHYL) SILOXANE Dow Silicones Corporation (US) 2026-02-25 EP disclosed
EP-3371248-B1 CONTINUOUS METHOD FOR REACTIONS WITH FINE-PARTICULATE ALKALI METAL DISPERSIONS CHT Germany GmbH (DE) 2025-03-26 EP disclosed
WO-2024220241-A1 PREPARATION OF AN ALKOXY- OR HYDROXY-TERMINATED POLY(PHENYLMETHYL) SILOXANE DOW SILICONES CORPORATION (US) 2024-10-24 WO disclosed
WO-2024173050-A1 PREPARATION OF AN ALKOXY-TERMINATED POLY(PHENYLMETHYL) SILOXANE DOW SILICONES CORPORATION (US) 2024-08-22 WO disclosed
US-11992538-B2 Polymerizable dental composition based on condensed silanes VOCO GMBH (DE) 2024-05-28 US disclosed
CN-108431092-B Continuous process for reacting with particulate alkali metal dispersions CHT R.拜特利希有限公司 2021-03-02 CN disclosed
US-20210052469-A1 POLYMERIZABLE DENTAL COMPOSITION BASED ON CONDENSED SILANES VOCO GMBH (DE) 2021-02-25 US disclosed
US-10640630-B2 Elastomeric composites containing modified fillers and functionalized elastomers CABOT CORPORATION (US) 2020-05-05 US disclosed
US-4917980-A Photoresponsive imaging members with hole transporting polysilylene ceramers XEROX CORPORATION (US) 1990-04-17 US disclosed
US-4826892-A CONDENSATION POLYMERIZATION OF DICHLORODIMETHYLSILANE AND DICHLOROMETHYLPHENYLSILANE TEIJIN LIMITED (JP) 1989-05-02 US disclosed
US-4822703-A Photoresponsive imaging members with polygermanes XEROX CORPORATION (US) 1989-04-18 US disclosed
US-4743411-A Process for producing shaped silicon carbide article from a polycarbosilastyrene copolymer TEIJIN LIMITED (JP) 1988-05-10 US disclosed
US-4717770-A CYCLOHEXANONE OXIME, ZEOLITES, SURFACE TREATMENT WITH ORGANOSILICON OR ORGANOGERMANIUM COMPOUNDS SUMITOMO CHEMICAL CO., LTD. (JP) 1988-01-05 US disclosed
EP-0236092-A2 Process for producing e-caprolactam SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1987-09-09 EP disclosed
EP-0130338-A2 Resist structure and processes for making and patterning it International Business Machines Corporation (US) 1985-01-09 EP disclosed
US-4464460-A Process for making an imaged oxygen-reactive ion etch barrier INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1984-08-07 US disclosed
US-4151327-A WATER AND OIL REPELLANT, DIMENSIONAL STABILITY, CLARITY OR OPACITY LAWTON WILLIAM R 1979-04-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11992538-B2 Polymerizable dental composition based on condensed silanes NCAPH, RCC1, NCAPD2 PNMT 4461/4885TAAR1 2152/4885IDO1 3791/4885
US-20210052469-A1 POLYMERIZABLE DENTAL COMPOSITION BASED ON CONDENSED SILANES NCAPH, RCC1, NCAPD2 PNMT 4461/4885TAAR1 2152/4885IDO1 3791/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.