SCHEMBL16404692

SCHEMBL16404692

[SiH3]CCc1c(Cl)cc(Cl)cc1Cl

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
TSHR P16473 6/20 0.38
HSD17B10 Q99714 4/20 0.38
CYP3A4 P08684 3/20 0.38
RECQL P46063 3/20 0.38
HPGD P15428 3/20 0.33
AHR P35869 1/20 0.33
TP53 P04637 1/20 0.32
KRAS P01116 1/20 0.32
TAAR1 Q96RJ0 1/20 0.31
MEN1 O00255 2/20 0.30
EGFR P00533 2/20 0.30
LMNA P02545 2/20 0.30
ESR1 P03372 2/20 0.30
ERBB2 P04626 2/20 0.30
LCK P06239 2/20 0.30
PGR P06401 2/20 0.30
POLB P06746 2/20 0.30
HTR1A P08908 2/20 0.30
ADRA2A P08913 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17552710 0.78 ALDH1A1 (0.45) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL11366462 0.74 ALDH1A1 (0.41) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL6130333 0.74 ALDH1A1 (0.41) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL17552722 0.74 TAAR1 (0.58) TSHRHSD17B10CYP3A4TAAR1MEN1
SCHEMBL10061037 0.74 ALDH1A1 (0.41) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL3415768 0.74 ALDH1A1 (0.43) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL18378725 0.74 ALDH1A1 (0.41) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL17552729 0.73 ALDH1A1 (0.48) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL1648004 0.72 ALDH1A1 (0.39) ALDH1A1TSHRHSD17B10CYP3A4RECQL
SCHEMBL29074259 0.71 ALDH1A1 (0.50) ALDH1A1TSHRHSD17B10CYP3A4RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 US disclosed
EP-2826826-A1 Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition Shin-Etsu Chemical Co., Ltd. (JP) 2015-01-21 EP disclosed