SCHEMBL16404735

SCHEMBL16404735

[SiH3]c1cc(Cl)c(Cl)cc1Cl

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ AHR P35869 6/20 0.44
▸ MAPK1 P28482 2/20 0.44
▸ TSHR P16473 4/20 0.40
▸ HSD17B10 Q99714 4/20 0.40
▸ HPGD P15428 3/20 0.40
▸ CYP3A4 P08684 2/20 0.39
▸ MAPK13 O15264 1/20 0.36
▸ CDK1 P06493 1/20 0.36
▸ PIM1 P11309 1/20 0.36
▸ DYRK1A Q13627 1/20 0.36
▸ PIM3 Q86V86 1/20 0.36
▸ CLK4 Q9HAZ1 1/20 0.36
▸ FLT1 P17948 1/20 0.35
▸ CASP1 P29466 1/20 0.33
▸ TP53 P04637 1/20 0.33
▸ GAA P10253 1/20 0.30
▸ ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL348913 0.76 AHR (0.67) AHRMAPK1TSHRHSD17B10HPGD
SCHEMBL10488073 0.67 CYP3A4 (0.59) AHRMAPK1TSHRHSD17B10HPGD
SCHEMBL17552683 0.65 — —
SCHEMBL16404713 0.65 — —
SCHEMBL9500636 0.63 — —
2,2',4,4',5,5'-Hexachlorobiphenyl SCHEMBL258301 0.62 AHR (1.00) AHRMAPK1TSHRHSD17B10HPGD
2,2',4,4',5,5'-Hexachlorobiphenyl SCHEMBL29367365 0.62 AHR (1.00) AHRMAPK1TSHRHSD17B10HPGD
SCHEMBL17552699 0.61 — —
SCHEMBL5792991 0.59 AHR (0.47) AHRMAPK1TSHRHSD17B10HPGD
SCHEMBL13197717 0.59 AHR (0.53) AHRMAPK1TSHRHSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9312127-B2 Method for producing semiconductor apparatus substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-20160064220-A1 METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-03 — — US disclosed
EP-2826826-A1 Composition for forming a coating type BPSG film, substrate formed a film by said composition, and patterning process using said composition Shin-Etsu Chemical Co., Ltd. (JP) 2015-01-21 — — EP disclosed
Send feedback