SCHEMBL1642904

SCHEMBL1642904

CCN(Cc1ccco1)Cc1ccco1

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.50
KDM4E B2RXH2 1/20 0.50
RIPK1 Q13546 1/20 0.47
ALOX5 P09917 1/20 0.47
TRPM8 Q7Z2W7 1/20 0.43
LDHA P00338 1/20 0.41
LDHB P07195 1/20 0.41
HAO1 Q9UJM8 1/20 0.41
POLB P06746 2/20 0.41
MAPT P10636 1/20 0.41
HPGD P15428 1/20 0.41
ALDH1A1 P00352 1/20 0.40
MAPK1 P28482 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2806112 0.96 HTT (0.50) HTTKDM4ERIPK1ALOX5TRPM8
Ammonia Solution, Strong SCHEMBL23877941 0.94 HTT (0.49) HTTKDM4ERIPK1ALOX5TRPM8
SCHEMBL6952454 0.86 KDM4E (0.56) HTTKDM4ERIPK1ALOX5POLB
SCHEMBL11461531 0.85 ALOX5 (0.44) HTTKDM4ERIPK1ALOX5TRPM8
SCHEMBL13662524 0.85 POLB (0.45) HTTKDM4ERIPK1ALOX5POLB
SCHEMBL29958592 0.84 KDM4E (0.49) HTTKDM4ERIPK1ALOX5TRPM8
SCHEMBL7004469 0.84 RIPK1 (0.43) HTTKDM4ERIPK1ALOX5TRPM8
SCHEMBL7327735 0.82 RIPK1 (0.49) HTTKDM4ERIPK1ALOX5TRPM8
Nitric Acid SCHEMBL30544994 0.82 RIPK1 (0.46) HTTKDM4ERIPK1ALOX5TRPM8
SCHEMBL22340462 0.82 MAPT (0.58) HTTPOLBMAPTHPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023247-B2 Antistatic treatment agent, and antistatic film, coated article and pattern forming method using the agent SHOWA DENKO K.K. (JP) 2015-05-05 US disclosed
EP-1807477-B1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO KK (JP) 2013-08-07 EP disclosed
US-20110097671-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO K.K. (JP) 2011-04-28 US disclosed
US-20090123771-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO K.K. (JP) 2009-05-14 US disclosed
US-20070252111-A1 Antistatic Treatment Agent, and Antistatic Film, Coated Article and Pattern Forming Method Using the Agents SHOWA DENKO K.K. (JP) 2007-11-01 US disclosed
EP-1807477-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT Showa Denko Kabushiki Kaisha (JP) 2007-07-18 EP disclosed
WO-2006033455-A1 ANTISTATIC TREATMENT AGENT, AND ANTISTATIC FILM, COATED ARTICLE AND PATTERN FORMING METHOD USING THE AGENT SHOWA DENKO K.K. (JP) 2006-03-30 WO disclosed