SCHEMBL16577611

SCHEMBL16577611

CO[Si](CCCN(C(C)=O)C(C)=O)(OC)OC

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM5 P08912 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
MTNR1A P48039 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19775776 0.83 LMNA (0.32) LMNA
SCHEMBL12251581 0.82 HIF1A (0.33)
SCHEMBL3212617 0.82 MTNR1A (0.35) LMNACHRM1MTNR1A
SCHEMBL26660021 0.81 ALDH1A1 (0.30)
SCHEMBL3041583 0.81 LMNA (0.33) LMNA
SCHEMBL31689754 0.80 CHRM2 (0.33) CHRM2CHRM4CHRM5CHRM1CHRM3
Acetic Acid SCHEMBL1973747 0.78 PAOX (0.34)
SCHEMBL22477356 0.77 LMNA (0.36) LMNA
SCHEMBL19970469 0.77 CA12 (0.41) LMNA
SCHEMBL16577616 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9627217-B2 Silicon-containing EUV resist underlayer film-forming composition including additive NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-04-18 US disclosed
US-20150079792-A1 SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ADDITIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-03-19 US disclosed